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Mask data generation method and mask

  • US 7,681,173 B2
  • Filed: 03/08/2007
  • Issued: 03/16/2010
  • Est. Priority Date: 03/09/2006
  • Status: Expired due to Fees
First Claim
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1. A mask data generation method, comprising:

  • arranging first and second auxiliary patterns adjacent to a device pattern, andperforming, by a computer, an optical proximity correction (OPC) process,wherein a first distance at which the first auxiliary pattern is spaced from a short side of the device pattern is set to be longer than a second distance at which the second auxiliary pattern is spaced from a long side of the device pattern upon arranging auxiliary patterns.

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