Transparent high temperature resistant and protective coating for domestic appliances and method for its deposition

• US 7,683,293 B2
• Filed: 03/25/2005
• Issued: 03/23/2010
• Est. Priority Date: 03/25/2004
• Status: Active Grant

• Current Assignee: Whirlpool Corporation
• Original Assignee: Whirlpool Corporation
• Inventors: Doyle, John, Buzzi, Ermanno, Friesen, Thomas
• Primary Examiner(s): FUQUA, SHAWNTINA T
• Application Number:
  US11/090,429
• Publication Number:
  US 20050269310A1
• Time in Patent Office: 1,824 Days
• Field of Search: 219/443.1, 219/444.1, 219/452.11, 219/452.1, 219/460.1, 219/461.1, 219/465.1, 219/467.1, 204/192.16, 204/192.26, 427/255.7, 427/419.2, 427/419.7, 427/529, 501 11- 12, 501/84, 501/133, 524/506, 524/268, 524/449, 524/499, 524/934
• US Class Current: 219/452.11
• CPC Class Codes: C23C 16/0272 Deposition of sub-layers, e.g. to promote the adhesion of the main coating
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 28/044 coatings specially adapted for cutting tools or wear applications
• CPC Class Codes: C23C 30/00 Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process C23C26/00, C23C28/00 take precedence

Abstract

A domestic appliance, particularly a cooking appliance, having a metallic surface, is provided with a coating based on silicon oxide. Such coating is deposited on the metallic surface by plasma enhanced chemical vapor deposition (PECVD). The coating protects the metallic surface from scratching, staining and thermal yellowing.

Claims

1. A method for providing a metal surface of a domestic appliance with a temperature-resistant coating, comprising:

depositing a silicon oxide film on the metal surface by plasma enhanced chemical vapor deposition, the precursor being a hexamethyldisiloxane or hexamethyldisilane.

2. A method for providing a metal surface of a domestic appliance with a temperature-resistant coating, comprising:

depositing a silicon oxide film on the metal surface by plasma enhanced chemical vapor deposition, the precursor being a siloxane wherein, before the deposition of the silicon oxide film, a silicon carbide film is applied to the metal surface by plasma enhanced chemical vapor deposition.

3. A method according to claim 2, wherein the precursor of the silicon carbide film is a silane or tetramethylsilane.