Lithographic apparatus and device manufacturing method

• US 7,684,008 B2
• Filed: 06/04/2004
• Issued: 03/23/2010
• Est. Priority Date: 06/11/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Smit, Joannes Theodoor, Bisschops, Theodorus Hubertus Josephus, Banine, Vadim Yevgenyevich, Dierichs, Marcel Mathijs Theodore Marie, Modderman, Theodorus Marinus
• Primary Examiner(s): Mathews; Alan A
• Application Number:
  US10/860,662
• Publication Number:
  US 20050024609A1
• Time in Patent Office: 2,118 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77, 430/30, 356/237.1, 356/338, 427/600, 427/560, 427/553
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916

Abstract

A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and

a bubble reduction device configured to reduce a size, a concentration, or both of bubbles in the liquid, the bubble reduction device comprising a bubble detector configured to detect the presence of bubbles in the liquid,

wherein the bubble detector comprises an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

2. An apparatus according to claim 1, wherein the ultrasonic transducer is configured to measure ultrasonic attenuation as a function of frequency.

3. An apparatus according to claim 1, wherein an ultrasonic transducer is arranged in a pulse-echo configuration, the transducer acting both to transmit ultrasonic waves and, after reflection, to receive ultrasonic waves that have been attenuated during propagation along a path through the liquid.

4. An apparatus according to claim 1, wherein the bubble detector comprises two spatially separated ultrasonic transducers, the first arranged to transmit ultrasonic waves, and the second to receive ultrasonic waves that have been attenuated during propagation along a path through the liquid between the two transducers.

5. An apparatus according to claim 1, wherein the bubble reduction device comprises a bubble removal device.

6. An apparatus according to claim 5, wherein the bubble removal device comprises a degassing device, the degassing device comprising an isolation chamber, wherein a space above liquid in the isolation chamber is maintained at a pressure below atmospheric pressure to encourage previously dissolved gases in the liquid to come out of solution and be pumped away.

7. An apparatus according to claim 5, wherein the bubble removal device is configured to provide a continuous flow of liquid over the projection system and the substrate to transport bubbles in the liquid out of the space between the projection system and the substrate.

8. An apparatus according to claim 5, wherein the bubble removal device includes two spatially separated ultrasonic transducers, arranged to produce ultrasonic standing-wave patterns within the liquid which trap bubbles within nodal regions, the bubble removal device being arranged to displace the bubbles through the use of a phase-adjusting device linked with the transducers, the phase-adjusting device causing spatial shift of nodal regions and bubbles trapped therein.

9. An apparatus according to claim 5, wherein the bubble removal device comprises an electric field generator configured to apply an electric field to the liquid, the electric field being capable of dislodging bubbles attached to the substrate.

10. An apparatus according to claim 5, wherein the bubble removal device comprises a heater configured to selectively control the temperature and therefore size of bubbles of a particular composition.

11. An apparatus according to claim 10, wherein the heater comprises a microwave source.

12. An apparatus according to claim 5, wherein the bubble removal device comprises a particle input device configured to introduce particles into the liquid, and a particle removal device configured to remove the particles from the liquid.

13. An apparatus according to claim 12, wherein the particles comprise a surface with characteristics that encourage bubbles to attach thereto.

14. An apparatus according to claim 1, wherein the bubble reduction device comprises a liquid pressurization device configured to pressurize the liquid above atmospheric pressure to minimize the size of bubbles and encourage bubble-forming gases to dissolve into the liquid.

15. An apparatus according to claim 1, wherein the composition of the liquid is chosen to have a lower surface tension than water.

16. An apparatus according to claim 1, wherein the bubble reduction device is configured to treat the liquid before it is supplied to the space between the projection system and the substrate.

17. An apparatus according to claim 16, wherein the treated liquid is kept in a sealed container, excess space in the sealed container comprising one or more of the following:

nitrogen gas, argon gas, helium gas or a vacuum.

18. A device manufacturing method comprising:

providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;

projecting a patterned radiation beam using the projection system, through the liquid, onto a target portion of a substrate; and

detecting the presence of, and reducing bubbles, in the liquid, the detecting comprising measuring attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

19. A method according to claim 18, wherein ultrasonic attenuation is measured as a function of frequency.

20. A method according to claim 18, comprising removing bubbles from the liquid.

21. A method according to claim 20, wherein removing bubbles from the liquid comprises degassing the liquid by maintaining a space of the liquid at a pressure below atmospheric pressure to encourage previously dissolved gases in the liquid to come out of solution and be pumped away.

22. A method according to claim 20, wherein removing bubbles comprises providing a continuous flow of liquid over the projection system and the substrate to transport bubbles in the liquid out of the space between the projection system and the substrate.

23. A method according to claim 20, wherein removing bubbles comprises producing ultrasonic standing-wave patterns within the liquid which trap bubbles within nodal regions and displacing the bubbles through a spatial shift of the nodal regions and bubbles trapped therein.

24. A method according to claim 20, wherein removing bubbles comprises applying an electric field to the liquid, the electric field being capable of dislodging bubbles attached to the substrate.

25. A method according to claim 20, wherein removing bubbles comprises selectively controlling the temperature and therefore size of bubbles of a particular composition.

26. A method according to claim 25, wherein the temperature is controlled using microwave radiation.

27. A method according to claim 20, wherein removing bubbles comprises introducing particles into the liquid and removing the particles from the liquid.

28. A method according to claim 27, wherein the particles comprise a surface with characteristics that encourage bubbles to attach thereto.

29. A method according to claim 18, wherein reducing bubbles comprises pressurizing the liquid above atmospheric pressure to minimize the size of bubbles and encourage bubble-forming gases to dissolve into the liquid.

30. A method according to claim 18, wherein the composition of the liquid is chosen to have a lower surface tension than water.

31. A method according to claim 18, wherein reducing bubbles, detecting bubbles or both occurs prior to the liquid is provided to the space between the projection system and the substrate.

32. A method according to claim 31, wherein the treated liquid is kept in a sealed container, excess space in the sealed container comprising one or more of the following:

nitrogen gas, argon gas, helium gas or a vacuum.

33. A method according to claim 18, wherein reducing bubbles, detecting bubbles or both occurs as the liquid is provided to or while the liquid is in the space between the projection system and the substrate.

34. A lithographic projection apparatus comprising:

a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and

an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

35. An apparatus according to claim 34, wherein the ultrasonic transducer is configured to measure ultrasonic attenuation as a function of frequency.

36. An apparatus according to claim 34, wherein the ultrasonic transducer is arranged in a pulse-echo configuration, the transducer acting both to transmit ultrasonic waves and, after reflection, to receive ultrasonic waves that have been attenuated during propagation along a path through the liquid.

37. An apparatus according to claim 34, comprising two spatially separated ultrasonic transducers, the first arranged to transmit ultrasonic waves, and the second to receive ultrasonic waves that have been attenuated during propagation along a path through the liquid between the two transducers.

38. An apparatus according to claim 34, further comprising a liquid quality monitor capable of switching the operational state of the projection apparatus between an active state and a suspended state, the active state being selected when the liquid quality is determined to be above a predefined threshold and the suspended state being selected when the liquid quality is determined to be below a predefined threshold state.

39. A lithographic projection apparatus comprising:

a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid;

a cleaning device configured to dislodge bubbles or contaminants from the substrate, the substrate table, or both the substrate and substrate table; and

an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

40. An apparatus according to claim 39, wherein the cleaning device comprises an ultrasonic transducer.

41. An apparatus according to claim 39, further comprising a detector configured to detect bubbles or particles in liquid.

42. An apparatus according to claim 41, wherein at least part of the detector is located in a member configured to at least partly confine liquid in the space.

43. An apparatus according to claim 39, wherein the cleaning device is located in a member configured to at least partly confine liquid in the space.

44. An apparatus according to claim 43, wherein the cleaning device is mechanically isolated from, or at least in damped connection with, the member.

45. An apparatus according to claim 43, wherein the member is configured to at least partly confine liquid to substantially only cover an area on the substrate or substrate table less than the area of the whole substrate.

46. An apparatus according to claim 39, wherein the cleaning device is configured to couple directly to the liquid in the space.

47. An apparatus according to claim 39, configured to provide a continuous flow of liquid over the projection system and the substrate and/or substrate table in the space.

48. An apparatus according to claim 39, wherein the cleaning device is configured to be mechanically released from the projection system.

49. An apparatus according to claim 39, wherein the cleaning device is configured to dislodge bubbles or contaminants automatically.

50. An apparatus according to claim 49, wherein the cleaning device is configured to cycle on and off according to a rate of contamination.

51. A lithographic projection apparatus comprising:

a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid;

a member configured to at least partly confine liquid in the space;

a cleaning device, located in the member, configured to dislodge bubbles or contaminants; and

an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

52. An apparatus according to claim 51, wherein the cleaning device is configured to dislodge bubbles or contaminants from the projection system.

53. An apparatus according to claim 51, wherein the cleaning device comprises an ultrasonic transducer.

54. An apparatus according to claim 51, wherein the cleaning device is mechanically isolated from, or at least in damped connection with, the member.

55. An apparatus according to claim 51, wherein the cleaning device is configured to couple directly to liquid in the space.

56. An apparatus according to claim 51, wherein the member is configured to at least partly confine liquid to substantially only cover an area on the substrate or substrate table less than the area of the whole substrate.

57. An apparatus according to claim 51, configured to provide a continuous flow of liquid over the projection system and the substrate and/or substrate table in the space.

58. An apparatus according to claim 51, wherein the cleaning device is configured to be mechanically released from the projection system.

59. An apparatus according to claim 51, wherein the cleaning device is configured to dislodge bubbles or contaminants automatically.

60. An apparatus according to claim 59, wherein the cleaning device is configured to cycle on and off according to a rate of contamination.

61. A lithographic projection apparatus comprising:

a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

a substrate table configured to hold a substrate;

a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid;

a cleaning device configured to dislodge bubbles or contaminants from a surface while the liquid fills a space between the projection system and the substrate, the substrate table, or both the substrate and substrate table; and

an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

62. An apparatus according to claim 61, wherein the cleaning device is located in a member configured to at least partly confine liquid in the space.

63. An apparatus according to claim 62, wherein the cleaning device is mechanically isolated from, or at least in damped connection with, the member.

64. An apparatus according to claim 62, wherein the member is configured to at least partly confine liquid to substantially only cover an area on the substrate or substrate table less than the area of the whole substrate.

65. An apparatus according to claim 61, wherein the cleaning device comprises an ultrasonic transducer.

66. An apparatus according to claim 61, wherein the cleaning device is configured to couple directly to the liquid in the space.

67. An apparatus according to claim 61, configured to provide a continuous flow of liquid over the projection system and the substrate and/or substrate table in the space.

68. An apparatus according to claim 61, wherein the cleaning device is configured to be mechanically released from the projection system.

69. An apparatus according to claim 61, wherein the cleaning device is configured to dislodge bubbles or contaminants automatically.