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Lithographic apparatus and device manufacturing method

  • US 7,684,008 B2
  • Filed: 06/04/2004
  • Issued: 03/23/2010
  • Est. Priority Date: 06/11/2003
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

    a substrate table configured to hold a substrate;

    a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

    a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and

    a bubble reduction device configured to reduce a size, a concentration, or both of bubbles in the liquid, the bubble reduction device comprising a bubble detector configured to detect the presence of bubbles in the liquid,wherein the bubble detector comprises an ultrasonic transducer configured to measure attenuation of ultrasonic waves in the liquid so as to obtain information about bubbles present in the liquid.

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