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Lithographic apparatus and device manufacturing method

  • US 7,684,014 B2
  • Filed: 12/01/2006
  • Issued: 03/23/2010
  • Est. Priority Date: 12/01/2006
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • a beam splitter configured to split a radiation beam into a plurality of radiation beams;

    a substrate stage configured to support a substrate;

    a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and

    a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source such that the substrate stage moves over an integral number of pitches of the interference pattern between two consecutive beams of radiation outputted by the radiation source.

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