Method of fabricating oxide semiconductor device
First Claim
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1. A method for fabricating a device using an oxide semiconductor, the method comprising:
- forming an oxide semiconductor on a substrate; and
changing a conductivity of a predetermined region of the oxide semiconductor by irradiating the predetermined region with an energy ray,wherein the changing of the conductivity of the predetermined region is performed to increase the conductivity of the predetermined region by irradiating the predetermined region with light having a wavelength equivalent to or greater than a band-gap energy of the oxide semiconductor.
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Abstract
A method for fabricating a device using an oxide semiconductor, including a process of forming the oxide semiconductor on a substrate and a process of changing the conductivity of the oxide semiconductor by irradiating a predetermined region thereof with an energy ray.
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Citations
4 Claims
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1. A method for fabricating a device using an oxide semiconductor, the method comprising:
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forming an oxide semiconductor on a substrate; and changing a conductivity of a predetermined region of the oxide semiconductor by irradiating the predetermined region with an energy ray, wherein the changing of the conductivity of the predetermined region is performed to increase the conductivity of the predetermined region by irradiating the predetermined region with light having a wavelength equivalent to or greater than a band-gap energy of the oxide semiconductor. - View Dependent Claims (2, 3, 4)
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Specification