Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
First Claim
1. A substrate processing tool comprising:
- a body defining a substrate processing region;
a substrate support adapted to support a substrate within the substrate processing region; and
a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface.
1 Assignment
0 Petitions
Accused Products
Abstract
Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
-
Citations
26 Claims
-
1. A substrate processing tool comprising:
-
a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; and a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface.
-
-
2. A substrate processing tool comprising:
-
a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface; and second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second UV radiation source and a second reflector partially surrounding the second UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface. - View Dependent Claims (3, 4, 5, 6)
-
-
7. A substrate processing tool comprising:
-
a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first elongated UV radiation source and a first reflector partially surrounding the first elongated UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface; and a second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second elongated UV radiation source and a second reflector partially surrounding the second elongated UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. A substrate processing system comprising:
-
a body defining first and second processing regions that are separate and adjacent to one another; a first substrate support adapted to support a first substrate within the first processing region and a second substrate support adapted to support a second substrate within the second processing region; a first UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a first UV radiation source and a first reflector partially surrounding the first UV radiation source, the first reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface; a second UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the second UV lamp comprising a second UV radiation source and a second reflector partially surrounding the second UV radiation source, the second reflector opposing inner and outer reflective panels, the inner reflective panel having a third reflective surface and the outer reflective panel having a fourth reflective surface that is asymmetric to the third reflective surface; a third UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the first UV lamp comprising a third UV radiation source and a third reflector partially surrounding the third UV radiation source, the third reflector having opposing inner and outer reflective panels, the inner reflective panel having a fifth reflective surface and the outer reflective panel having a sixth reflective surface that is asymmetric to the fifth reflective surface; and a fourth UV lamp spaced apart from the substrate support and configured to transmit UV radiation to a substrate positioned on the substrate support, the fourth UV lamp comprising a fourth UV radiation source and a fourth reflector partially surrounding the fourth UV radiation source, the fourth reflector opposing inner and outer reflective panels, the inner reflective panel having a seventh reflective surface and the outer reflective panel having an eighth reflective surface that is asymmetric to the seventh reflective surface. - View Dependent Claims (18, 19, 20)
-
-
21. A method of curing a layer of dielectric material formed over a substrate, the method comprising:
-
placing the substrate having the dielectric material formed thereon on a substrate support in a substrate processing chamber; and exposing the substrate to UV radiation by (i) generating the radiation with first and second UV sources, (ii) redirecting UV radiation generated by the first UV source with first and second reflective surfaces that are asymmetric to each other and combine to concentrate the UV radiation on a first half of the substrate, and (iii) redirecting UV radiation generated by the second UV source with third and fourth reflectors that are asymmetric to each other and combine to concentrate the UV radiation on a second half of the substrate opposite the first half. - View Dependent Claims (22, 23)
-
-
24. An apparatus for generating ultraviolet radiation, the apparatus comprising:
-
a resonant cavity; an elongated bulb positioned within the resonant cavity; a reflector partially surrounding the elongated bulb and mounted longitudinally within the resonant cavity in a spaced relationship to the bulb, the reflector having opposing inner and outer reflective panels, the inner reflective panel having a first reflective surface and the outer reflective panel having a second reflective surface that is asymmetric to the first reflective surface. - View Dependent Claims (25)
-
-
26. A method of curing a layer of dielectric material formed over a substrate, the method comprising:
-
placing the substrate having the dielectric material formed thereon on a substrate support in a substrate processing chamber; and exposing the substrate to UV radiation by generating the radiation with an elongated UV source and redirecting the UV radiation generated by the UV source with first and second opposing reflective surfaces that partially surround the radiation source and are asymmetric to each other.
-
Specification