Controlled vapor deposition of biocompatible coatings over surface-treated substrates

• US 7,695,775 B2
• Filed: 12/05/2005
• Issued: 04/13/2010
• Est. Priority Date: 06/04/2004
• Status: Active Grant

• Current Assignee: SPTS Technologies Limited (KLA Corporation)
• Original Assignee: Applied Microstructures, Inc. (KLA Corporation)
• Inventors: Chinn, Jeffrey D., Nowak, Romuald, Kobrin, Boris
• Primary Examiner(s): Meeks; Timothy H
• Assistant Examiner(s): Sellman; Cachet I
• Application Number:
  US11/295,129
• Publication Number:
  US 20060088666A1
• Time in Patent Office: 1,590 Days
• Field of Search: 427/553, 427/558, 427/595, 427/337, 427/532, 427/535, 427/536, 427/596
• US Class Current: 427/558
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: B05D 3/064 involving also the use of a gas
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, a siloxane substrate surface is treated using a combination of ozone and UV radiation to render the siloxane surface more hydrophilic, and subsequently a functional coating is applied in-situ over the treated surface of the siloxane substrate.

Claims

1. A method converting a surface of a siloxane substrate from a hydrophobic nature, where a water droplet contact angle is in a range of about 90 degrees to about 130 degrees, to a hydrophilic nature, where said water droplet contact angle ranges from about 5 degrees to about 50 degrees, wherein said surface of said siloxane substrate is treated with ozone in the presence of UV radiation, wherein a biocompatible vapor-deposited coating is applied over said siloxane substrate treated with ozone in the presence of UV radiation, and where said biocompatible coating includes at least one organic functional layer, wherein said method comprises the steps of:

a) exposing said surface of said siloxane substrate to an ozone-comprising gas in a processing chamber, wherein UV radiation is applied during exposure of said siloxane surface to said ozone-comprising gas;

b) subsequently, without exposure of said ozone and UV radiation treated siloxane substrate to ambient conditions which contaminate or react with said treated surface, exposing said surface to a silicon chloride containing vapor in the presence of moisture, to form a hydrophilic silicon oxide layer on said treated siloxane substrate surface; and

c) subsequently, without exposure of said hydrophilic silicon oxide layer to ambient conditions which contaminate or react with said hydrophilic silicon oxide layer, exposing said silicon oxide layer to a functionalized silane precursor vapor to form a layer selected from the group consisting of a monolayer, a self-aligned monolayer, and a polymerized cross-linked layer.

2. A method in accordance with claim 1, wherein said UV radiation exhibits a wavelength ranging from about 172 nm to about 254 nm, and a UV flux density ranging from about 20 mW/cm² to about 1.0 W/cm².

3. A method in accordance with claim 2, wherein said UV flux density ranges from about 50 mW/cm² to about 0.2 W/cm².

4. A method in accordance with claim 2, wherein the treatment time period of said siloxane surface with a combination of ozone and UV radiation ranges from about 60 minutes to about 1 minute.

5. A method in accordance with claim 4, wherein said treatment is carried out at a temperature ranging from about 20°

C. to about 80°

C.

6. A method in accordance with claim 2, wherein said treatment is carried out at a pressure ranging from about 1 Torr to about atmospheric pressure.

7. A method in accordance with claim 1, wherein said siloxane is PDMS.

8. A method in accordance with claim 1 or claim 2, wherein said siloxane substrate is treated with ozone in the presence of UV radiation, followed by deposition of a PEG layer.

9. A method in accordance with claim 1 or claim 2, wherein said siloxane substrate is treated with ozone in the presence of UV radiation, followed by an oxygen plasma, followed by deposition of a PEG layer.

10. A method in accordance with claim 1 or claim 2, wherein a layer of PEG is applied over said siloxane substrate, where said siloxane substrate has been treated with a plasma which includes ozone in the presence of UV radiation.

11. A method in accordance with claim 10, wherein said plasma which includes ozone also includes oxygen.

12. A method in accordance with claim 8, wherein said layer of PEG is applied using a vapor deposition technique which includes a stagnation reaction step.

13. A method in accordance with claim 9, wherein said layer of PEG is applied using a vapor deposition technique which includes a stagnation reaction step.

14. A method in accordance with claim 10, wherein said layer of PEG is applied using a vapor deposition technique which includes a stagnation reaction step.

15. A method in accordance with claim 11, wherein said layer of PEG is applied using a vapor deposition technique which includes a stagnation reaction step.

16. A method in accordance with claim 1 or claim 2 wherein said biocompatible coating includes at least one oxide-based layer and at least one organic functional layer.

17. A method in accordance with claim 1, wherein said at least one organic functional layer includes a surface layer which is generated from a polyethylene glycol-comprising precursor.

18. A method in accordance with claim 16, wherein said at least one organic functional layer includes a surface layer which is generated from a polyethylene glycol-comprising precursor.

19. A method in accordance with claim 1, including an additional step:

d) repeating steps a) through c), or repeating steps b) through c), or repeating step c) a nominal number of times, without exposing said substrate to ambient conditions.

20. A method in accordance with claim 19, wherein said processing chamber pressure subatmospheric pressure during step a) ranges from about 1 Torr to about 1 atmosphere.

21. A method in accordance with claim 1, wherein said silicon chloride-containing precursor in step b) is silicon tetrachloride.