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Method of determining a focus position for a substrate exposure process and substrate exposure apparatus capable of performing the same

  • US 7,697,113 B2
  • Filed: 10/31/2006
  • Issued: 04/13/2010
  • Est. Priority Date: 11/09/2005
  • Status: Active Grant
First Claim
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1. A method of determining a focus position for a substrate exposure process, the method comprising:

  • illuminating a reticle having a plurality of light-transmitting regions with an off-axis illumination light having a plurality of poles;

    focusing a projected light passing through the plurality of light-transmitting regions onto a projection plane;

    measuring an intensity of the projected light at the projection plane, the intensity of the projected light having a plurality of peaks of intensity; and

    determining the focus position based on a distance between the plurality of peaks of intensity.

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