Resonant scanning mirror
First Claim
1. A lithography apparatus, comprising:
- a patterning device that is configured to pattern a beam of radiation and generate patterned beam pulses, the patterned beam pulses having a first frequency;
a substrate table configured to support and scan a substrate at a scanning velocity; and
a projection system including a scanning device, the scanning device including a reflective device and a plurality of flexures, the plurality of flexures being coupled to and extending from a bottom surface of the reflective device and being configured to allow the reflective device to resonate about an axis of rotation, wherein the scanning device is configured to scan the patterned beam pulses onto a target area of the substrate, andwherein the resonant frequency of the scanning device is substantially a same value as the first frequency, an angular deflection of the scanning device is synchronized with a position of the substrate table, and an amplitude of resonant motion is controlled to substantially match an angular velocity of the scanning device to the scanning velocity of the substrate table during each of the pulses.
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Accused Products
Abstract
A system and method allow for a more effective synchronous scanning mirror (SSM). A lithography apparatus comprises an illumination system, a patterning device, a substrate table, and a projection system. The illumination system conditions a beam of radiation received from a radiation source operating at a first frequency. The patterning device patterns the beam. The substrate table supports and scans a substrate at a scanning velocity. The projection system includes a scanning device including a reflective device and a plurality of flexures. The plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation. The scanning device is configured to scan the patterned beam onto a target area of the substrate The resonant frequency of the scanning device is substantially equal to the first frequency, and is synchronized with the scanning velocity.
77 Citations
21 Claims
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1. A lithography apparatus, comprising:
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a patterning device that is configured to pattern a beam of radiation and generate patterned beam pulses, the patterned beam pulses having a first frequency; a substrate table configured to support and scan a substrate at a scanning velocity; and a projection system including a scanning device, the scanning device including a reflective device and a plurality of flexures, the plurality of flexures being coupled to and extending from a bottom surface of the reflective device and being configured to allow the reflective device to resonate about an axis of rotation, wherein the scanning device is configured to scan the patterned beam pulses onto a target area of the substrate, and wherein the resonant frequency of the scanning device is substantially a same value as the first frequency, an angular deflection of the scanning device is synchronized with a position of the substrate table, and an amplitude of resonant motion is controlled to substantially match an angular velocity of the scanning device to the scanning velocity of the substrate table during each of the pulses. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 19, 20)
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15. A device manufacturing method, comprising:
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(a) producing a beam of radiation at a first frequency; (b) scanning a substrate using a substrate stage at a scanning velocity; (c) patterning the beam of radiation; (d) resonating a reflective device of a scanning mirror about an axis of rotation at substantially the first frequency using flexures coupled to and extending from a bottom surface of the reflective device; and (e) synchronizing the scanning of the scanning mirror to both the first frequency and the scanning velocity, such that the patterned beam is directed onto a target portion of the substrate. - View Dependent Claims (16, 17, 18)
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21. A lithography apparatus, comprising:
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a patterning device configured to pattern a beam of radiation, the beam of radiation having a first frequency; a substrate table that supports and scans a substrate at a scanning velocity; and a projection system including a scanning device, the scanning device including a reflective device and a plurality of flexures, the plurality of flexures being coupled to and extending from a bottom surface of the reflective device and being configured to allow the reflective device to resonate about an axis of rotation, wherein the scanning device is configured to scan the patterned beam onto a target area of the substrate, and wherein the resonant frequency of the scanning device is substantially a same value as the first frequency, and is synchronized with the scanning velocity.
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Specification