Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic projection apparatus, comprising:
- an illumination system configured to condition a beam of radiation from a radiation source;
a support structure configured to support a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
a substrate table configured to hold a substrate;
a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and
a device positioned in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system, the first plane located between the radiation source and the support structure, and the device comprising a blade selectively insertable into the beam of radiation, wherein the blade includes a solid blade and a partially opaque blade, wherein the partially opaque blade comprises a grid of rods, bars or wires.
1 Assignment
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Accused Products
Abstract
A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
34 Citations
16 Claims
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1. A lithographic projection apparatus, comprising:
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an illumination system configured to condition a beam of radiation from a radiation source; a support structure configured to support a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam of radiation onto a target portion of the substrate; and a device positioned in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system, the first plane located between the radiation source and the support structure, and the device comprising a blade selectively insertable into the beam of radiation, wherein the blade includes a solid blade and a partially opaque blade, wherein the partially opaque blade comprises a grid of rods, bars or wires. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A device manufacturing method, comprising:
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using a patterning device to endow a beam of radiation from a radiation source with a pattern in its cross-section; projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material at least partially covering a substrate using a projection system; and selectively inserting a blade of a plurality of blades into the beam of radiation in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system, the first plane located between the radiation source and the patterning device, wherein the blade includes a solid blade and a partially opaque blade, wherein the partially opaque blade comprises a arid of rods, bars or wires. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A lithographic projection apparatus, comprising:
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an illumination system having a plurality of mirrors; a support configured to support a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, the projection system having a plurality of mirrors; and a reflective blade selectively insertable into the beam of radiation in front of at least one of the plurality of mirrors to reflect a portion of the beam of radiation to a beam dump. - View Dependent Claims (16)
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Specification