Methods and apparatus for sensing characteristics of the contents of a process abatement reactor

• US 7,700,049 B2
• Filed: 10/31/2006
• Issued: 04/20/2010
• Est. Priority Date: 10/31/2005
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Vermeulen, Robert M., Clark, Daniel O., Raoux, Sebastien, Crawford, Shaun W.
• Primary Examiner(s): BHAT, NINA NMN
• Application Number:
  US11/555,000
• Publication Number:
  US 20070172399A1
• Time in Patent Office: 1,267 Days
• Field of Search: 422/171, 422/172, 422/173, 110/238, 431/353
• US Class Current: 422/171
• CPC Class Codes: B01D 2251/104 Ozone
• CPC Class Codes: B01D 2251/106 Peroxides
• CPC Class Codes: B01D 2251/2062 Ammonia
• CPC Class Codes: B01D 2258/0216 from CVD treatment or semi-conductor manufacturing
• CPC Class Codes: B01D 53/38 Removing components of undefined structure
• CPC Class Codes: B01D 53/68 Halogens or halogen compounds
• CPC Class Codes: B01D 53/74 General processes for purification of waste gases; Apparatus or devices specially adapted therefor B01D53/92 takes precedence
• CPC Class Codes: B01D 53/79 Injecting reactants
• CPC Class Codes: B01D 53/8659 Removing halogens or halogen compounds
• CPC Class Codes: B01D 53/8662 Organic halogen compounds
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
• CPC Class Codes: F23C 7/02 Disposition of air supply not passing through burner to obtain a cyclonic tapering flame when burning pulverulent fuel F23C5/32
• CPC Class Codes: F23D 2900/00016 Preventing or reducing deposit build-up on burner parts, e.g. from carbon
• CPC Class Codes: F23G 7/065 using gaseous or liquid fuel
• CPC Class Codes: F23M 5/00 Casings; Linings; Walls

Abstract

In certain embodiments, an apparatus is provided for use in removing pollutants from a gas stream. The apparatus includes a thermal reaction unit formed from a plurality of stacked porous ceramic rings. At least one of the stacked ceramic sections may be adapted to allow sensing of a characteristic of contents of the central chamber. In some embodiments, waste gas inlets to the thermal reaction unit may be angled to create a helical vortex within the thermal reaction unit. Other aspects are provided.

Claims

1. An apparatus for use during the abatement of a semiconductor manufacturing process comprising:

a thermal reaction unit having;

an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked ceramic sections;

at least one waste gas inlet in fluid communication with the central chamber, adapted to introduce a gaseous waste stream to the central chamber, and disposed so as to direct the gaseous waste stream away from the interior porous wall of the chamber;

a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and

a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall with sufficient pressure to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber.

2. The apparatus of claim 1 wherein the waste gas inlet is angled toward a center of the central chamber.

3. The apparatus of claim 1 wherein the waste gas inlet is angled toward a central reaction zone within the central chamber.

4. The apparatus of claim 1 wherein the waste gas inlet is disposed so as to create a turbulent combustion zone within the central chamber.

5. The a apparatus of claim 1 wherein the waste gas inlet is disposed so as to create a swirling combustion zone within the central chamber.

6. The apparatus of claim 1 wherein the waste gas inlet is angled from a vertical line within the range of approximately two to approximately 45 degrees toward a center of the central chamber.

7. The apparatus of claim 1 wherein the waste gas inlet is disposed so as to create a helical vortex of waste gas within the central chamber.

8. The apparatus of claim 1 wherein the waste gas inlet is disposed so as to maximize a residence time of the waste gas within the central chamber.

9. The apparatus of claim 1 wherein an angle of the waste gas inlet is adjustable.

10. The apparatus of claim 9 wherein an angle of the waste gas inlet is adjustable based upon a desired residence time of the waste gas within the central chamber.

11. The apparatus of claim 9 wherein an angle of the waste gas inlet is adjustable based upon a composition of the waste gas.

12. The apparatus of claim 9 wherein an angle of the waste gas inlet is adjustable based upon a temperature of the central chamber.

13. An apparatus for use with a thermal reaction unit comprising:

a plurality of waste gas inlet ports adapted to direct a flow of waste gas in a helical pattern wherein each waste inlet port includes an actuator adapted to allow adjustment of an angle of the respective waste gas inlet port.