Stacked bit line dual word line nonvolatile memory
First Claim
1. A method of fabricating an arrangement of nonvolatile memory devices, the method comprising:
- (a) providing a semiconductor substrate;
(b) forming an oxide layer;
(c) forming a plurality of word lines substantially disposed above the oxide layer;
(d) forming a plurality of bit lines substantially disposed above the oxide layer;
(e) etching a plurality of via holes formed between the plurality of word lines and the plurality of bit lines substantially in contact with the plurality of word lines and the plurality of bit lines; and
(f) forming an anti-fuse dielectric material substantially disposed beside the plurality of bit lines and substantially in electrical contact with the plurality of bit lines, the anti-fuse dielectric material forming a plurality of side wall anti-fuse dielectrics beside the bit lines;
(g) forming a plurality of via plugs substantially in electrical contact with the plurality of word lines and substantially in contact with the plurality of side wall anti-fuse dielectrics.
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Accused Products
Abstract
An arrangement of nonvolatile memory devices, having at least one memory device level stacked level by level above a semiconductor substrate, each memory level comprising an oxide layer substantially disposed above a semiconductor substrate, a plurality of word lines substantially disposed above the oxide layer; a plurality of bit lines substantially disposed above the oxide layer; a plurality of via plugs substantially in electrical contact with the word lines and, an anti-fuse dielectric material substantially disposed on side walls beside the bit lines and substantially in contact with the plurality of bit lines side wall anti-fuse dielectrics.
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Citations
9 Claims
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1. A method of fabricating an arrangement of nonvolatile memory devices, the method comprising:
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(a) providing a semiconductor substrate; (b) forming an oxide layer; (c) forming a plurality of word lines substantially disposed above the oxide layer; (d) forming a plurality of bit lines substantially disposed above the oxide layer; (e) etching a plurality of via holes formed between the plurality of word lines and the plurality of bit lines substantially in contact with the plurality of word lines and the plurality of bit lines; and (f) forming an anti-fuse dielectric material substantially disposed beside the plurality of bit lines and substantially in electrical contact with the plurality of bit lines, the anti-fuse dielectric material forming a plurality of side wall anti-fuse dielectrics beside the bit lines; (g) forming a plurality of via plugs substantially in electrical contact with the plurality of word lines and substantially in contact with the plurality of side wall anti-fuse dielectrics. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification