Apparatus, system, and method for detecting cracking within an aftertreatment device

• US 7,701,231 B2
• Filed: 03/20/2007
• Issued: 04/20/2010
• Est. Priority Date: 03/20/2007
• Status: Active Grant

• Current Assignee: Cummins Filtration Incorporated (Cummins Incorporated)
• Original Assignee: Cummins Filtration Incorporated (Cummins Incorporated)
• Inventors: Lara-Curzio, Edgar, Stafford, Randall J., Shyam, Amit, Yonushonis, Thomas M.
• Primary Examiner(s): NGUYEN, HOAI AN D
• Application Number:
  US11/688,697
• Publication Number:
  US 20090108856A1
• Time in Patent Office: 1,127 Days
• Field of Search: 324/718, 324/715, 324/713, 324/691, 324/649, 324/600, 324/693, 324/525, 95/4, 95/6, 95/7, 95/14, 95/18, 374/183, 374/185, 374/160
• US Class Current: 324/718
• CPC Class Codes: B01D 2273/18 Testing of filters, filter elements, sealings
• CPC Class Codes: B01D 46/0086 Filter condition indicators

Abstract

An apparatus, system, and method are disclosed for detecting cracking in a particulate filter. The method may include providing an apparatus comprising an aftertreatment device with a substrate and a substrate surface, a conductive material forming a conduction path bonded to the surface of the substrate surface, and access points configured to allow a resistance measurement of the conduction path. The method may include measuring the resistance of the conduction path, and determining if one or more cracks have occurred on the substrate surface based on the resistance measurement. The method may further include labeling the degradation level of the aftertreatment device based on the indicated amount of cracking, and replacing the aftertreatment device with an equivalent aftertreatment device, based on the degradation level, after a service event.

Claims

1. An apparatus for detecting cracking in an aftertreatment device, the apparatus comprising:

an aftertreatment device comprising a substrate and a substrate surface;

a conductive material forming at least one conduction path bonded to the substrate surface;

a plurality of access points conductively coupled to the at least one conduction path;

a degradation module that determines at least one degradation value for the aftertreatment device, the degradation value being based on a resistance value across the at least one conduction path; and

an event detection module that determines a degradation event on the aftertreatment device based at least partially on a high temperature event experienced by the aftertreatment device.

2. The apparatus of claim 1, wherein the at least one conduction path comprises a decal of the conductive material applied to the substrate surface.

3. The apparatus of claim 1, wherein the at least one conduction path comprises the conductive material applied by one of painting and printing on the substrate surface.

4. The apparatus of claim 1, further comprising a resistance module that interprets a resistance value across the at least one conduction path between at least two of the plurality of access points.

5. The apparatus of claim 4, further comprising a labeling module that generates a device degradation label for the aftertreatment device based on the at least one degradation value.

6. The apparatus of claim 1, wherein the conductive material comprises a member formed from the group consisting of a conductive metal, a conductive metal alloy, a resistive layer, and a cermet.

7. The apparatus of claim 6, wherein the conductive material is baked onto the substrate surface at about 850 degrees C during the manufacture of the apparatus.

8. The apparatus of claim 1, wherein the at least one conduction path comprises the conductive material applied at a thickness between about 10 micrometers and about 130 micrometers.

9. The apparatus of claim 1, wherein the at least one conduction path is configured to intersect a high-stress area of the aftertreatment device, the high-stress area of the aftertreatment device comprising an axial position between about 0.3 X to about 0.9 X, wherein X represents an axial position defined such that X=0 is an upstream end of the aftertreatment device, and X=1 is a downstream side of the aftertreatment device.

10. The apparatus of claim 9, wherein the aftertreatment device comprises a cylindrical ceramic device comprising a plurality of rectangular cells and an outer wall, and wherein the high-stress area further comprises the substrate surface at an intersection between one of the rectangular cells and the outer wall such that the intersected rectangular cell is divided approximately diagonally by the outer wall.

11. The apparatus of claim 1, wherein the at least one conduction path comprises a plurality of parallel conduction paths connecting at least two of the access points.

12. The apparatus of claim 11, wherein the plurality of parallel conduction paths connecting at least two of the access points comprises an observed area, the apparatus further comprising a plurality of observed areas.

13. The apparatus of claim 12, wherein each of the plurality of observed areas is configured to measure a distinct axial portion of the aftertreatment device.

14. The apparatus of claim 12, wherein each of the plurality of observed areas is configured to measure a distinct radial portion of the aftertreatment device.

15. The apparatus of claim 4, wherein the at least one conduction path comprises a plurality of parallel conduction paths connecting at least two of the access points, the apparatus further comprising a cracking history module configured to store a plurality of degradation values at specified time intervals.

16. The apparatus of claim 4, wherein the at least one conduction path comprises a plurality of parallel conduction paths connecting at least two of the access points, the apparatus further comprising a cracking history module that stores a pre-event degradation value and a post-event degradation value in response to each degradation event occurrence.

17. A method of detecting fractures in an aftertreatment device, the method comprising:

providing an apparatus comprising;

an aftertreatment device comprising a substrate and a substrate surface, a conductive material forming at least one conduction path bonded to the substrate surface, and a plurality of access points conductively coupled to the at least one conduction path;

measuring resistance values between two of the plurality of access points;

determining a plurality of degradation values for the aftertreatment device based on the resistance values, wherein the plurality of degradation values are determined at predetermined time intervals; and

predicting at least one degradation event on the aftertreatment device, wherein the predetermined time intervals are based on an estimated duration of the predicted at least one degradation event on the aftertreatment device.

18. The method of claim 17, wherein determining at least one degradation value for the aftertreatment device based on the at least one resistance value comprises determining the aftertreatment device is cracked when the resistance value is consistent with an open circuit.

19. The method of claim 17, wherein the at least one conduction path comprises a plurality of parallel conduction paths connecting at least two of the access points, and wherein determining at least one degradation value for the aftertreatment device based on the at least one resistance value comprises determining a crack propagation index based on the resistance value.

20. The method of claim 19, further comprising determining a device degradation label based on the crack propagation index.

21. The method of claim 20, wherein the aftertreatment device comprises a particulate filter, the method further comprising replacing the particulate filter with a second particulate filter comprising an equivalent device degradation label in response to a service event.

22. The method of claim 19, wherein the plurality of parallel conduction paths connecting at least two of the access points comprises an observed area, the apparatus further comprising a plurality of observed areas, and wherein determining a crack propagation state of the aftertreatment device comprises determining a plurality of degradation values corresponding to the plurality of observed areas.

23. The method of claim 22, further comprising determining a device degradation label based on the plurality of degradation values.

24. A system for detecting cracking in an aftertreatment device, the system comprising:

an aftertreatment device configured to treat exhaust gas from an internal combustion engine, the aftertreatment device comprising a substrate and a substrate surface;

a conductive material forming at least one conduction path bonded to the substrate surface;

a plurality of access points conductively coupled to the at least one conduction path;

an event detection module that determines a degradation event on the aftertreatment device;

a degradation module that determines a plurality of degradation values for the aftertreatment device, wherein each degradation value is based on a resistance value across the at least one conduction path; and

a cracking history module that stores a rolling buffer of the determined degradation values, wherein degradation values determined during a predetermined time period prior to the degradation event are stored as a pre-event degradation value and degradation values determined during a predetermined time period after the degradation event are stored as a post-event degradation value, wherein crack detection is based at least partially on a comparison between the pre-event and post-event degradation values.

25. The system of claim 24, further comprising a service tool comprising a resistance module that interprets a resistance value across the at least one conduction path.

26. The system of claim 24, further comprising an electronic control module (ECM) comprising a resistance module that interprets a resistance value across the at least one conduction path.

27. The system of claim 26, wherein the ECM further comprises a fault module that sets a fault indicator based on the at least one degradation value.