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Nanoporous organosilicas as pre-concentration materials for sensors

  • US 7,705,062 B2
  • Filed: 01/31/2006
  • Issued: 04/27/2010
  • Est. Priority Date: 09/08/2005
  • Status: Expired due to Fees
First Claim
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1. A molecularly imprinted material comprising pores or channels having surfaces that include a plurality of molecularly imprinted cavities;

  • wherein the material comprises a polymer made from polymerizing a monomer having the structural formula (OR)3Si—

    B-A-B—

    Si(OR)3;

    wherein A is a divalent organic group;

    wherein each B is an independently selected saturated or unsaturated divalent hydrocarbon group or a covalent bond;

    wherein each R is an independently selected saturated or unsaturated monovalent hydrocarbon group; and

    wherein the material is made by a method comprising;

    combining a solvent, the monomer, and a surfactant coupled to an imprint group;

    wherein the imprint group is decylaminetrinitrobenzene;

    wherein molecules of the surfactant self-assemble to form at least one supramolecular structure having a surface and wherein the imprint groups are exposed on the surface; and

    wherein the supramolecular structure serves as a template for the organizing of molecules of the monomer along the surface of the supramolecular structure and around the exposed imprint groups;

    polymerizing the monomer to form a solid structure having a surface topography complementary to the surface topography of the supramolecular structure and having indentations complementary to the shape of the exposed imprint groups; and

    removing the supramolecular structure from the solid structure.

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