Gas distribution system having fast gas switching capabilities

• US 7,708,859 B2
• Filed: 04/30/2004
• Issued: 05/04/2010
• Est. Priority Date: 04/30/2004
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Sam, Jose Tong, Sadjadi, Reza, Lenz, Eric H., Dhindsa, Rajinder, Huang, Zhisong
• Primary Examiner(s): Hassanzadeh; Parviz
• Assistant Examiner(s): Dhingra; Rakesh
• Application Number:
  US10/835,175
• Publication Number:
  US 20050241763A1
• Time in Patent Office: 2,195 Days
• Field of Search: 118/715, 156/345.29, 156/345.33, 156/345.34
• US Class Current: 156/345.34
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

A gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus is provided. The gas distribution system can include a gas supply section, a flow control section and a switching section. The gas supply section provides first and second gases, typically gas mixtures, to the flow control section, which controls the flows of the first and second gases to the chamber. The chamber can include multiple zones, and the flow control section can supply the first and second gases to the multiple zones at desired flow ratios of the gases. The gas distribution system can continuously supply the first and second gases to the switching section and the switching section is operable to switch the flows of the first and second gases, such that one of the first and second process gases is supplied to the chamber while the other of the first and second gases is supplied to a by-pass line, and then to switch the gas flows. The switching section preferably includes fast switching valves operable to quickly open and close to allow fast switching of the first and second gases, preferably without the occurrence of undesirable pressure surges or flow instabilities in the flow of either gas.

Claims

1. A gas distribution system for supplying gas to a plasma processing chamber including a gas distribution member having inner and outer zones which are flow insulated from each other, the gas distribution system comprising:

a first gas passage in fluid communication with a first process gas source, the inner zone of the gas distribution member of the plasma processing chamber and a bypass line;

a second gas passage in fluid communication with the first process gas source, the outer zone of the gas distribution member of the plasma processing chamber and the bypass line;

a third gas passage in fluid communication with a second process gas source, the inner zone and the by-pass line;

a fourth gas passage in fluid communication with the second process gas source, the outer zone and the by-pass line; and

a controller connected in control communication to a plurality of fast switching valves that are operably connected to receive signals from the controller to open or close and the controller is configured so that (i) the first process gas is supplied to the inner and outer zones via the first and second gas passages, while the second process gas is supplied to the by-pass line via the third and fourth gas passages, and (ii) to change the flows of the first and second process gases so that the second process gas is supplied to the inner and outer zones via the third and fourth gas passages, while the first process gas is supplied to the by-pass line via the first and second gas passages; and

at least one first flow restrictor, at least one second flow restrictor, at least one third flow restrictor and at least one fourth flow restrictor arranged along the first, second, third and fourth gas passages, respectively, the first, second, third and fourth flow restrictors being operable to maintain an approximately constant gas pressure in a region of the first, second, third and fourth gas passages upstream of and proximate the first, second, third and fourth flow restrictors.

2. The gas distribution system of claim 1, wherein the fast switching valves can be opened and/or closed within a period of less than about 100 ms after receiving a signal.

3. The gas distribution system of claim 1, wherein:

the first gas passage and the second gas passage are in fluid communication with a first gas line in fluid communication with the first process gas source;

the third gas passage and the fourth gas passage are in fluid communication with a second gas line in fluid communication with the second process gas source;

each of the first, second, third and fourth gas passages divides into two separate gas passages;

the plurality of fast switching valves comprises;

a first fast switching valve arranged along each of the two separate gas passages of the first gas passage;

a second fast switching valve arranged along each of the two separate gas passages of the second gas passage;

a third fast switching valve arranged along each of the two separate gas passages of the third gas passage;

a fourth fast switching valve arranged along each of the two separate gas passages of the fourth gas passage;

the first and second fast switching valves are operably connected to receive signals to open one of the first fast switching valves and one of the second fast switching valves while one of the third fast switching valves and one of the fourth fast switching valves are closed so that the first process gas is supplied to the inner and outer zones via the first gas line and the first and second gas passages while the second process gas is supplied to the by-pass line via the second gas line and the third and fourth gas passages; and

the third and fourth fast switching valves are operably connected to receive signals to open one of the third fast switching valves and one of the fourth fast switching valves while one of the first fast switching valves and one of the second fast switching valves are closed so that the second process gas is supplied to the inner and outer zones via the second gas line and the third and fourth gas passages while the first process gas is supplied to the by-pass line via the first gas line and the first and second gas passages.

4. The gas distribution system of claim 3, wherein:

the at least one first flow restrictor is arranged along the first gas passage upstream of the first fast switching valves;

the at least one second flow restrictor is arranged along the second gas passage upstream of the second fast switching valves;

the at least one third flow restrictor is arranged along the third gas passage upstream of the third fast switching valves; and

the at least one fourth flow restrictor is arranged along the fourth gas passage upstream of the fourth fast switching valves.

5. The gas distribution system of claim 4, wherein the first gas passage has a volume between the first flow restrictor and the first fast switching valves of less than about 10 cm³, the second gas passage has a volume between the second flow restrictor and the second fast switching valves of less than about 10 cm³, the third gas passage has a volume between the third flow restrictor and the third fast switching valves of less than about 10 cm³, and the fourth gas passage has a volume between the fourth flow restrictor and the fourth fast switching valves of less than about 10 cm³.

6. The gas distribution system of claim 3, wherein:

the at least one first flow restrictor includes a first flow restrictor arranged along each of the two separate gas passages of the first gas passage downstream of each respective first fast switching valve;

the at least one second flow restrictor includes a second flow restrictor arranged along each of the two separate gas passages of the second gas passage downstream of each respective second fast switching valve;

the at least one third flow restrictor includes a third flow restrictor arranged along each of the two separate gas passages of the third gas passage downstream of each respective third fast switching valve; and

the at least one fourth flow restrictor includes a fourth flow restrictor arranged along each of the two separate gas passages of the fourth gas passage downstream of each respective fourth fast switching valve;

wherein the first, second, third and fourth flow restrictors are operably connected to maintain an approximately constant gas pressure in a region of the first, second, third and fourth gas passages upstream of and proximate the respective first, second, third and fourth flow restrictors.

7. The gas distribution system of claim 3, wherein the controller is operable to control the opening and closing of the first, second, third and fourth fast switching valves within a period of less than about 100 ms after receiving a signal.

8. The gas distribution system of claim 7, wherein the controller is operable to control the opening and closing of the first second, third and fourth fast switching valves within a period of less than about 50 ms after receiving a signal.

9. The gas distribution system of claim 3, further comprising a flow control section, comprising:

at least one fifth gas passage in fluid communication with the first and second gas passages and with the first gas line;

at least one first valve operable to allow the first process gas to be supplied from the first gas line to the first and second gas passages via the at least one fifth gas passage;

at least one sixth gas passage in fluid communication with the third and fourth gas passages and with the second gas line; and

at least one second valve operable to allow the second process gas to be supplied from the second gas line to the third and fourth gas passages via the at least one sixth gas passage.

10. The gas distribution system of claim 9, further comprising a gas supply section including:

the first gas line;

the second gas line;

at least one third valve operable to allow supply of the first process gas from the first process gas source to at least one of the first and second gas lines; and

at least one fourth valve operable to allow supply of the second process gas from the second process gas source to at least one of the first and second gas lines.

11. The gas distribution system of claim 9, wherein the flow control section includes at least one fifth flow restrictor and at least one sixth flow restrictor in fluid communication with the respective fifth and sixth gas passages, the fifth and sixth flow restrictors being operable to maintain an approximately constant gas pressure in a region upstream and proximate of the fifth and sixth flow restrictors.

12. The gas distribution system of claim 11, wherein the at least one fifth flow restrictor includes at least two fifth flow restrictors that have a different flow conductance from each other, and the at least one sixth flow restrictor includes at least two sixth flow restrictors that have a different flow conductance from each other.

13. The gas distribution system of claim 9, wherein the fifth and sixth gas passages are in fluid communication with at least one tuning gas source which is operable to supply a tuning gas to at least one of the fifth and gas passages.

14. The gas distribution system of claim 1, wherein the fast switching valves can be opened and/or closed within a period of less than about 50 ms after receiving a signal.

15. A plasma processing apparatus, comprising:

a plasma processing chamber comprising a showerhead electrode assembly including a showerhead electrode plate and having the inner and outer zones, and a plasma confinement zone within the plasma processing chamber having a volume of about ½

liter to 4 liters; and

the gas distribution system according to claim 1 in fluid communication with the inner and outer zones of the showerhead electrode assembly;

wherein the gas distribution system is operable to substantially replace the first process gas or the second process gas in the plasma confinement zone with the other of the first process gas or the second process gas within a period of less than about 1 s.

16. The plasma processing apparatus of claim 15, wherein the gas distribution system is operable to substantially replace the first process gas or the second process gas in the plasma confinement zone with the other of the first process gas or the second process gas within a period of less than about 200 ms.

17. A plasma processing apparatus, comprising:

a plasma processing chamber comprising a showerhead electrode assembly including a showerhead electrode plate and having inner and outer zones which are flow insulated from each other, and a plasma confinement zone within the plasma processing chamber having a volume of about ½

liter to 4 liters; and

a gas distribution system in fluid communication with the inner and outer zones of the showerhead electrode plate, the gas distribution system comprising;

a first gas passage in fluid communication with a first process gas source, the inner zone of the showerhead electrode plate and a bypass line;

a second gas passage in fluid communication with the first process gas source, the outer zone of the showerhead electrode plate and the bypass line;

a third gas passage in fluid communication with a second process gas source, the inner zone and the by-pass line;

a fourth gas passage in fluid communication with the second process gas source, the outer zone and the by-pass line; and

a controller connected in control communication to a plurality of fast switching valves that are operably connected to receive signals from the controller to open or close and the controller is configured so that (i) the first process gas is supplied to the inner and outer zone, via the first and second gas passages, while the second process gas is supplied to the by-pass line via the third and fourth gas passages, and (ii) to change the flows of the first and second process gases so that the second process gas is supplied to the inner and outer zones via the third and fourth gas passages, while the first process gas is supplied to the by-pass line via the first and second gas passages; and

at least one first flow restrictor, at least one second flow restrictor, at least one third flow restrictor and at least one fourth flow restrictor arranged along the first, second, third and fourth gas passages, respectively, the first, second, third and fourth flow restrictors being operable to maintain an approximately constant gas pressure in a region of the first, second, third and fourth gas passages upstream of and proximate the first, second, third and fourth flow restrictors,

wherein the first process gas comprises a fluorocarbon and is operable to etch a dielectric layer on a semiconductor substrate in the chamber and the second process gas comprises a flurohydrocarbon and is effective to form a polymer deposit which protects a mask layer above the dielectric layer, and

wherein the gas distribution system further comprises a controller operable to (a) substantially replace the first process gas or the second process gas in the plasma confinement zone with the other of the first process gas or the second process gas within a period of less than about 200 ms, (b) to supply the first process gas for a period of about 5 seconds to about 20 seconds and, (c) to supply the second process gas for a period of about 1 second to about 3 seconds.