Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride
First Claim
1. A photosensitive composition useful as a protective layer, said composition being alkaline-resistant and negative-acting and said composition comprising a first polymer, a second polymer, and a photoacid generator dissolved or dispersed in a solvent system, wherein:
- said first polymer comprises;
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Accused Products
Abstract
New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting.
34 Citations
40 Claims
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1. A photosensitive composition useful as a protective layer, said composition being alkaline-resistant and negative-acting and said composition comprising a first polymer, a second polymer, and a photoacid generator dissolved or dispersed in a solvent system, wherein:
said first polymer comprises; - View Dependent Claims (2, 3, 4, 39, 40)
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5. A method of forming a microelectronic structure, said method comprising:
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providing a microelectronic substrate; applying a primer layer to said substrate, said primer layer comprising a silane dispersed or dissolved in a solvent system; applying a photosensitive layer to said primer layer, said photosensitive layer being alkaline-resistant and comprising a photoacid generator, a first polymer, and a second polymer dispersed or dissolved in a solvent system, wherein; said first polymer comprises; - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A microelectronic structure comprising:
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a microelectronic substrate; a primer layer adjacent said substrate, said primer layer comprising a crosslinked silane; a photosensitive layer adjacent said primer layer, said photosensitive layer being alkaline-resistant and comprising; a first polymer comprising; - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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Specification