Negative resist composition and method for forming resist pattern

• US 7,709,179 B2
• Filed: 04/07/2006
• Issued: 05/04/2010
• Est. Priority Date: 04/20/2005
• Status: Active Grant

• Current Assignee: Tokyo OHKA Kogyo Company Limited
• Original Assignee: Tokyo OHKA Kogyo Company Limited
• Inventors: Iwashita, Jun
• Primary Examiner(s): CHU, JOHN S Y
• Application Number:
  US11/909,071
• Publication Number:
  US 20090035697A1
• Time in Patent Office: 1,488 Days
• Field of Search: 430/270.1, 430/325, 430/921, 430/922
• US Class Current: 430/270.1
• CPC Class Codes: G03F 7/0045 with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
• CPC Class Codes: G03F 7/0046 with perfluoro compounds, e.g. for dry lithography G03F7/0048 takes precedence
• CPC Class Codes: G03F 7/0382 the macromolecular compound being present in a chemically amplified negative photoresist composition
• CPC Class Codes: Y10S 430/122 Sulfur compound containing
• CPC Class Codes: Y10S 430/123 Sulfur in heterocyclic ring

Abstract

A chemically amplified negative resist composition is provided in addition to a method of forming a resist pattern from which a desirable pattern shape can be obtained. A negative resist composition in which a resin component (A) contains a resin component (A1) having a structural unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group and a structural unit (a2) derived from an acrylic acid ester and containing a hydroxyl group-containing alicyclic group; and an acid generator component (B) contains an acid generator (B1) expressed by the following general formula (B1):

(where R⁵¹ represents a straight chain, branched chain or cyclic alkyl group or a fluorinated alkyl group; R⁵² represents a hydrogen atom, hydroxyl group, halogen atom, straight chain, branched chain or cyclic alkyl group, straight chain or branched chain halogenated alkyl group, or straight chain or branched chain alkoxy group; R⁵³ represents an aryl group which may have a substituent; and n represents an integer of 1 to 3).

Claims

1. A negative resist composition, comprising:

(A) an alkali soluble resin component;

(B) an acid generator component which generates an acid upon exposure; and

(C) a crosslinking agent component,

wherein the component (A) contains an alkali soluble resin component (A1) having a structural unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group, a structural unit (a2) derived from an acrylic acid ester and containing a hydroxyl group-containing alicyclic group and a structural unit (a3) which is derived from acrylic acid, does not have a ring structure, and has an alcoholic hydroxyl group at a side chain; and

wherein

the component (B) contains an acid generator (B1) expressed by a general formula (B1) below;

2. The negative resist composition according to claim 1, wherein the component (B) contains an acid generator (B2) different from the acid generator (B1).

3. The negative resist composition according to claim 1, wherein the structural unit (a1) includes a structural unit represented the following general formula (1);

4. The negative resist composition according to claim 1, wherein the structural unit (a2) includes a structural unit including an alicyclic group having 5 to 15 carbon atoms.

5. The negative resist composition according to claim 1, wherein the structural unit (a2) includes a structural unit expressed by the following general formula (2);

6. The negative resist composition according to claim 1, wherein the structural unit (a3) includes a structural unit expressed by the following general formula (3);

7. The negative resist composition according to claim 1, wherein the structural unit (a3) includes a structural unit derived from α

-(hydroxyalkyl)acrylic acid alkyl ester.

8. The negative resist composition according to claim 1, wherein the structural unit (a3) includes a structural unit derived from acrylic acid (α

-alkyl) hydroxyalkyl ester.

9. The negative resist composition according to claim 1, wherein the component (C) includes at least one selected from the group consisting of a melamine-based crosslinking agent, a urea-based crosslinking agent, an ethylene urea-based crosslinking agent, and a glycoluril-based crosslinking agent.

10. The negative resist composition according to claim 1, further comprising a nitrogen-containing organic compound (D).

11. A method of forming a resist pattern comprising:

forming a resist film on a substrate by using a negative resist composition according to claim 1;

selectively exposing the resist film; and

forming a resist pattern by subjecting the resist film to an alkali developing treatment.