Conductive layers for hafnium silicon oxynitride films
First Claim
Patent Images
1. A method comprising:
- forming a first nanolaminate on a substrate, the nanolaminate containing a first plurality of different insulating materials including a first layer of hafnium silicon oxynitride (HfxSiyOzNr with x>
0, y>
0, z>
0, and r>
0), the first layer of hafnium silicon oxynitride formed using a self-limiting monolayer or partial monolayer sequencing process;
forming a layer of titanium nitride by the self-limiting monolayer or partial monolayer sequencing process on the first layer of hafnium silicon oxynitride;
forming a second nanolaminate on the substrate, the second nanolaminate containing a second plurality of different insulating materials including a second layer of hafnium silicon oxynitride (WfkSilOmNn with k>
0, l>
0, m>
0, and n>
0), the second layer of hafnium silicon oxynitride formed on the substrate using the self-limiting monolayer or partial monolayer sequencing process, the second layer of hafnium silicon oxynitride processed such that the second layer of hafnium silicon oxynitride is separate from the first layer of hafnium silicon oxynitride; and
forming a layer of tantalum by the self-limiting monolayer or partial monolayer sequencing process on the second layer of hafnium silicon oxynitride.
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Abstract
Electronic apparatus and methods of forming the electronic apparatus include a HfSiON film on a substrate for use in a variety of electronic systems. The HfSiON film may be structured as one or more monolayers. The HfSiON film may be formed by atomic layer deposition. Electrodes to a dielectric containing a HfSiON may be structured as one or more monolayers of titanium nitride, tantalum, or combinations of titanium nitride and tantalum. The titanium nitride and the tantalum may be formed by atomic layer deposition.
974 Citations
39 Claims
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1. A method comprising:
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forming a first nanolaminate on a substrate, the nanolaminate containing a first plurality of different insulating materials including a first layer of hafnium silicon oxynitride (HfxSiyOzNr with x>
0, y>
0, z>
0, and r>
0), the first layer of hafnium silicon oxynitride formed using a self-limiting monolayer or partial monolayer sequencing process;forming a layer of titanium nitride by the self-limiting monolayer or partial monolayer sequencing process on the first layer of hafnium silicon oxynitride; forming a second nanolaminate on the substrate, the second nanolaminate containing a second plurality of different insulating materials including a second layer of hafnium silicon oxynitride (WfkSilOmNn with k>
0, l>
0, m>
0, and n>
0), the second layer of hafnium silicon oxynitride formed on the substrate using the self-limiting monolayer or partial monolayer sequencing process, the second layer of hafnium silicon oxynitride processed such that the second layer of hafnium silicon oxynitride is separate from the first layer of hafnium silicon oxynitride; andforming a layer of tantalum by the self-limiting monolayer or partial monolayer sequencing process on the second layer of hafnium silicon oxynitride. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 38)
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14. A method comprising:
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forming a first nanolaminate disposed in an integrated circuit on a substrate, the nanolaminate containing a first plurality of different insulating materials including a first layer of hafnium silicon oxynitride (HfxSiyOzNr with x>
0, v>
0, z>
0, and r>
0), the layer of hafnium silicon oxynitride formed using atomic layer deposition;forming a titanium nitride layer by atomic layer deposition on the first layer of hafnium silicon oxynitride; forming a second nanolaminate, the second nanolaminate containing a second plurality of different insulating materials including a second layer of hafnium silicon oxynitride (HfkSilOmNn with k>
0, l>
0, m>
0, and n>
0) using atomic layer deposition, the second nanolaminate disposed in the integrated circuit, the second layer of hafnium silicon oxynitride processed such that the second layer of hafnium silicon oxynitride is separate from the first layer of hafnium silicon oxynitride; andforming a tantalum layer by atomic layer deposition on the second layer of hafnium silicon oxynitride. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. A method comprising:
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providing a controller; and coupling an integrated circuit to the controller, the integrated circuit formed by a method including; forming a first nanolaminate on a substrate, the nanolaminate containing a first plurality of different insulating materials including a first layer of hafnium silicon oxynitride (HfxSiyOzNr with x>
0, v>
0, z>
0, and r>
0), the first layer of hafnium silicon oxynitride formed using a self-limiting monolayer or partial monolayer sequencing process;forming a layer of titanium nitride by the self-limiting monolayer or partial monolayer sequencing process on the first layer of hafnium silicon oxynitride; forming a second nanolaminate on the substrate, the second nanolaminate containing a second plurality of different insulating materials including a second layer of hafnium silicon oxynitride (HfkSilOmNn with k>
0, l>
0, m>
0, and n>
0), the second layer of hafnium silicon oxynitride formed using the self-limiting monolayer or partial monolayer sequencing process, the second layer of hafnium silicon oxynitride processed such that the second layer of hafnium silicon oxynitride is separate from the first layer of hafnium silicon oxynitride; andforming a layer of tantalum by the self-limiting monolayer or partial monolayer sequencing process on the second layer of hafnium silicon oxynitride. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37)
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39. A method comprising:
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forming a first layer of hafnium silicon oxynitride (HfxSiyOzNr with x>
0, y>
0, z>
0, and r>
0) on a substrate, the first layer of hafnium silicon oxynitride formed using a self-limiting monolayer or partial monolayer sequencing process;forming a layer of titanium nitride by the self-limiting monolayer or partial monolayer sequencing process on the first layer of hafnium silicon oxynitride; forming a second layer of hafnium silicon oxynitride (HfkSilOmNn with k>
0, l>
0, m>
0, and n>
0), the second layer of hafnium silicon oxynitride formed on the substrate using the self-limiting monolayer or partial monolayer sequencing process, the second layer of hafnium silicon oxynitride processed such that the second layer of hafnium silicon oxynitride is separate from the first layer of hafnium silicon oxynitride; andforming a layer of tantalum by the self-limiting monolayer or partial monolayer sequencing process on the second layer of hafnium silicon oxynitride, wherein forming the first and/or second layer of hafnium silicon oxynitride includes; forming alternating layers of hafnium oxide and silicon nitride using the self-limiting monolayer or partial monolayer sequencing process; and annealing the alternating layers of hafnium oxide and silicon nitride to convert the layers of hafnium oxide and silicon nitride to the respective layer of hafnium silicon oxynitride.
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Specification