Structure of a micro electro mechanical system and the manufacturing method thereof
First Claim
1. A pre-release structure configured to form an optical interference display cell upon removal of a sacrificial layer, the pre-release structure comprising:
- a first electrode;
a sacrificial layer;
a first material layer; and
a conductor layer comprising a light reflective surface;
wherein;
the sacrificial layer is positioned between the first electrode and the first material layer;
the first material layer is positioned between the sacrificial layer and the conductor layer;
the conductor layer is susceptible to etching by an etchant suitable to remove the sacrificial layer;
the first material layer is adapted to protect the light reflective layer from etching when the sacrificial layer is removed using the etchant; and
the optical interference display cell formed after removal of the sacrificial layer is configured to interferometrically reflect light contacting the light reflective surface.
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Accused Products
Abstract
A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.
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Citations
22 Claims
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1. A pre-release structure configured to form an optical interference display cell upon removal of a sacrificial layer, the pre-release structure comprising:
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a first electrode; a sacrificial layer; a first material layer; and a conductor layer comprising a light reflective surface; wherein; the sacrificial layer is positioned between the first electrode and the first material layer; the first material layer is positioned between the sacrificial layer and the conductor layer; the conductor layer is susceptible to etching by an etchant suitable to remove the sacrificial layer; the first material layer is adapted to protect the light reflective layer from etching when the sacrificial layer is removed using the etchant; and the optical interference display cell formed after removal of the sacrificial layer is configured to interferometrically reflect light contacting the light reflective surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification