System and method for generating pattern data used to control a pattern generator
First Claim
1. A method, comprising:
- receiving a pattern data set;
detecting a type of pattern generator being used to pattern a beam of radiation from a plurality of types of pattern generators;
modifying the pattern data set using parameters corresponding to the detected type of pattern generator;
producing a pattern with the pattern generator using the modified pattern data set;
patterning the beam of radiation with the pattern generator having the pattern based on the producing; and
projecting the patterned beam onto a target portion of an object.
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Accused Products
Abstract
A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude and phase transmittance that matches modulation capabilities of a patterning device being used. The modified pattern data is used by a dynamic patterning device to pattern impinging light, which is then projected onto an object. The system and method comprise using a pattern data generating device, a modification device, a dynamic pattern generator, and a projection system. The pattern data generating device generates pattern data corresponding to a pattern on a static patterning device. The modification device receives the pattern data and modifies the pattern data using characteristics of a type of the dynamic pattern generator being used. The dynamic pattern generator receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation. The projection system projects the patterned beam onto the object.
27 Citations
16 Claims
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1. A method, comprising:
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receiving a pattern data set; detecting a type of pattern generator being used to pattern a beam of radiation from a plurality of types of pattern generators; modifying the pattern data set using parameters corresponding to the detected type of pattern generator; producing a pattern with the pattern generator using the modified pattern data set; patterning the beam of radiation with the pattern generator having the pattern based on the producing; and projecting the patterned beam onto a target portion of an object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification