×

Process system health index and method of using the same

  • US 7,713,760 B2
  • Filed: 03/26/2004
  • Issued: 05/11/2010
  • Est. Priority Date: 05/16/2003
  • Status: Active Grant
First Claim
Patent Images

1. A method of monitoring a processing system for processing a substrate during the course of semiconductor manufacturing comprising:

  • acquiring data from said processing system for a plurality of observations, said data comprising a plurality of data variables;

    determining one or more principal components of said data for said plurality of observations using principal components analysis;

    applying a first weighting factor to a first one of said plurality of data variables and a second weighting factor to a second one of said plurality of data variables during said principal components analysis;

    acquiring additional data from said processing system;

    determining at least one statistical quantity from one or more scores calculated from a projection of said additional data onto said one or more principal components determined by using said first weighting factor and said second weighting factor;

    determining a control limit for said at least one statistical quantity; and

    comparing said at least one statistical quantity to said control limit,wherein the first weighting factor is based on a first relative importance of the first one of said plurality of data variables, the second weighting factor is based on a second relative importance of the second one of said plurality of data variables, and the first relative importance is different from the second relative importance.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×