Method of designing a projection system, lithographic apparatus and device manufacturing method

• US 7,714,307 B2
• Filed: 09/08/2006
• Issued: 05/11/2010
• Est. Priority Date: 09/09/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV), Carl Zeiss AG (Carl-Zeiss-Stiftung), Technische Universiteit Delft
• Original Assignee: ASML Netherlands BV (ASML Holding NV), Carl Zeiss AG (Carl-Zeiss-Stiftung), Technische Universiteit Delft
• Inventors: van Turnhout, Maarten, Marinescu, Oana Elena, Bociort, Florian
• Primary Examiner(s): Vanore; David A.
• Assistant Examiner(s): Johnston; Phillip A.
• Application Number:
  US11/517,578
• Publication Number:
  US 20070165296A1
• Time in Patent Office: 1,341 Days
• Field of Search: 250/492.2
• US Class Current: 250/492.2
• CPC Class Codes: G02B 13/143 for use with ultraviolet radiation
• CPC Class Codes: G02B 17/0663 off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
• CPC Class Codes: G02B 27/0012 Optical design, e.g. procedures, algorithms, optimisation routines

Abstract

Optimization of a projection system is performed to obtain a starting configuration that is at a local minimum of the merit function or simply a previously known minimum system is used as the starting configuration. A zero-thickness meniscus lens is inserted at a surface in the local minimum starting configuration with N surfaces to construct a saddle point with Morse Index=1 having N+2 surfaces. The saddle point is perturbed and optimization is performed on both sides of the saddle, and the distances at the two surfaces that have been introduced are increased, to generate two new configurations, m₁ and m₂, that are new minima in the merit function. Each resulting configuration is output, e.g., as a table of parameters specifying the projection system or as a computer file for use in making an actual projection system.

Claims

1. A method of designing a projection system for a lithographic projection apparatus, comprising:

obtaining a projection system starting configuration comprising a plurality of surfaces and having a merit function value corresponding to a local minimum in a merit function space;

inserting two additional surfaces at a reference surface in the starting configuration, with a separation between the additional surfaces and between the additional surfaces and the reference surface, with the optical material between the additional surfaces being substantially the same as that at the reference surface and with the curvatures of the two additional surfaces being substantially the same as the curvature of the reference surface to generate a saddle point configuration of a projection system corresponding to a saddle point in merit function space, wherein the saddle point has a Morse Index value of 1;

perturbing the saddle point configuration and performing optimization on at least one side of the saddle point to obtain a new projection system configuration having a merit function value corresponding to a local minimum in the merit function space;

increasing the separation between the two inserted surfaces and between the inserted surfaces and the reference surface at which they were inserted; and

outputting the resulting projection system configuration.

2. The method according to claim 1, wherein the saddle point has a Morse Index value of 1.

3. The method according to claim 1, wherein the separation between the additional surfaces and between the additional surfaces and the reference surface is less than about 10⁻

4 m.

4. The method according to claim 1, wherein the separation between the additional surfaces and between the additional surfaces and the reference surface is substantially zero.

5. The method according to claim 1, wherein two new projection system configurations are obtained by performing optimization on two sides of the saddle point, and the optimized configuration which, after increasing the separation between the two inserted surfaces, has the lower merit function value of the two configurations is selected as the resulting projection system configuration to be output.

6. The method according to claim 1, wherein the projection system comprises a plurality of lenses.

7. The method according to claim 6, wherein the two additional surfaces comprise the surfaces of a meniscus lens.

8. The method according to claim 1, for designing a projection system for a lithographic projection apparatus using a beam of radiation with wavelength shorter than about 300 nm.

9. The method according to claim 1, wherein the projection system comprises a plurality of mirrors.

10. The method according to claim 9, wherein the two additional surfaces comprise a pair of reflective surfaces.

11. The method according to claim 1, for designing a projection system for a lithographic projection apparatus using a beam of radiation with wavelength shorter than about 30 nm.

12. The method according to claim 1, further comprising removing at least one lens or two reflective surfaces from a projection system configuration obtained after performing optimization on the saddle point configuration.

13. The method according to claim 12, comprising performing further optimization of the configuration with the at least one lens or two reflective surfaces removed.

14. The method according to claim 1, comprising performing further optimization of the configuration after increasing the separation between the two inserted surfaces and between the inserted surfaces and the reference surface at which they were inserted.

15. A method comprising iterating the method as defined in claim 1, but inserting the two additional surfaces at a different reference surface in the projection system configuration at each iteration.

16. The method according to claim 1, wherein the method is computer-implemented.

17. A lithographic apparatus comprising:

an illumination system configured to condition a radiation beam;

a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate; and

a projection system designed using the method of claim 1 and configured to project the patterned radiation beam onto a target portion of the substrate.

18. A device manufacturing method comprising projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate using a projection system designed using the method according to claim 1.

19. A device manufactured in accordance with the method of claim 18.

20. A computer program comprising computer-executable code that when executed on a computer system causes the computer system to perform a method according to claim 1.

21. A computer-readable medium storing a computer program according to claim 20.