Exposure apparatus, exposure method, and device manufacturing method
First Claim
Patent Images
1. An exposure apparatus that exposes a substrate, comprising:
- an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and
a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.
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Abstract
An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields.
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Citations
35 Claims
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1. An exposure apparatus that exposes a substrate, comprising:
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an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. An exposure method for exposing a substrate, the method comprising:
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irradiating first and second exposure fields with first and second exposure lights via an optical system having an optical element on which the first and second exposure lights are incident, to multiply expose the substrate; and detecting at least one of the fit exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification