Laser beam conditioning system comprising multiple optical paths allowing for dose control
First Claim
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1. A radiation beam conditioning system, configured to condition a pulsed beam of radiation for use in a lithographic apparatus, the radiation beam conditioning system comprising:
- a radiation beam divider configured to divide the pulsed beam of radiation along at least first, second and third optical paths;
a radiation beam combiner configured to re-combine the pulses of radiation from the at least first, second, and third optical paths to form a single output pulsed beam of radiation; and
a radiation pulse trimmer configured to the pulse of radiation traveling along the first optical path,wherein the radiation pulse trimmer is configured to trim the pulse of radiation within the first optical path, such that a total amount of energy of the single output pulsed beam of radiation is substantially a predetermined level, andwherein optical path lengths of the first, second and third optical paths, between the radiation beam divider and the radiation beam combiner, are different.
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Abstract
A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
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Citations
15 Claims
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1. A radiation beam conditioning system, configured to condition a pulsed beam of radiation for use in a lithographic apparatus, the radiation beam conditioning system comprising:
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a radiation beam divider configured to divide the pulsed beam of radiation along at least first, second and third optical paths; a radiation beam combiner configured to re-combine the pulses of radiation from the at least first, second, and third optical paths to form a single output pulsed beam of radiation; and a radiation pulse trimmer configured to the pulse of radiation traveling along the first optical path, wherein the radiation pulse trimmer is configured to trim the pulse of radiation within the first optical path, such that a total amount of energy of the single output pulsed beam of radiation is substantially a predetermined level, and wherein optical path lengths of the first, second and third optical paths, between the radiation beam divider and the radiation beam combiner, are different. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A lithographic apparatus, comprising:
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a radiation beam conditioning system comprising; a radiation beam divider configured to divide the pulsed beam of radiation along at least first, second and third optical paths; a radiation beam combiner configured to re-combine the pulses of radiation from the at least first, second, and third optical paths to form a single output pulsed beam of radiation; and a radiation pulse trimmer configured to the pulse of radiation traveling along the first optical path, wherein the radiation pulse trimmer is configured to trim the pulse of radiation within the first optical path, such that a total amount of energy of the single output pulsed beam of radiation is substantially a predetermined level, and wherein optical path lengths of the first, second and third optical paths, between the radiation beam divider and the radiation beam combiner, are different; a patterning device configured to pattern the single output pulsed beam of radiation; and a projection system configured to project the patterned beam onto target portions of a substrate.
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15. A device manufacturing method for conditioning a pulsed beam of radiation, for use in imaging a pattern onto a substrate;
- the conditioning comprising;
directing the pulsed beam of radiation along at least first, second and third optical paths; trimming pulses of radiation within the first optical path; and re-combining the pulses of radiation from the first, second, and third optical paths to form a single output pulsed beam of radiation; wherein the pulses of radiation within the first optical path are trimmed such that a total energy of the single output pulsed beam of radiation is substantially a predetermined level; and wherein optical path lengths of the first, second and third optical paths, between the radiation beam being divided and re-combined, are different.
- the conditioning comprising;
Specification