Gas switching mechanism for plasma processing apparatus

• US 7,717,061 B2
• Filed: 09/23/2005
• Issued: 05/18/2010
• Est. Priority Date: 03/25/2003
• Status: Expired due to Fees

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Gomi, Atsushi, Ishizaka, Tadahiro, Oshima, Yasuhiro, Shigeoka, Takashi, Fukuda, Yukio, Arami, Junichi, Kawamura, Kohei, Yoshii, Naoki, Kojima, Yasuhiko
• Primary Examiner(s): Hassanzadeh; Parviz
• Assistant Examiner(s): DHINGRA, RAKESH KUMAR
• Application Number:
  US11/232,943
• Publication Number:
  US 20060027167A1
• Time in Patent Office: 1,698 Days
• Field of Search: 118/715, 156/345.33, 156/345.34
• US Class Current: 118/723.0MP
• CPC Class Codes: C23C 16/34 Nitrides C23C16/303 takes precedence
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45542 Plasma being used non-continuously during the ALD reactions
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: Y10T 137/86558 Plural noncommunicating flow paths
• CPC Class Codes: Y10T 137/86566 Rotary plug
• CPC Class Codes: Y10T 137/86638 Rotary valve
• CPC Class Codes: Y10T 137/86726 Valve with bypass connections
• CPC Class Codes: Y10T 137/86743 Rotary
• CPC Class Codes: Y10T 137/86751 Plug
• CPC Class Codes: Y10T 137/86871 Plug

Abstract

A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).

Claims

1. A processing apparatus comprising:

a plasma excitation device that excites a first gas to be supplied;

a processing vessel;

a switching mechanism which includes a cylinder, a rotation valve rotatably provided in the cylinder, and a motor mechanism that rotates the rotation valve; and

a bypass line connected to the switching mechanism cylinder,

wherein the cylinder is provided with a first passageway supplied with an excited first gas from the excitation device, a second passageway supplied with a second gas, and a third passageway for supplying the excited first or the second gas into the processing vessel,

wherein the rotation valve has an annular passageway, formed of a groove-shape and circumferentially formed around almost an entire periphery of the rotation valve except for a portion thereof, for connecting the first passageway to the bypass line; and

a central passageway disposed below the annular passageway, having a horizontal passageway extending from a peripheral opening in a side surface of the rotation valve to a center portion of the rotation valve and a connected vertical passageway extending downwards from the center portion to the third passageway along an axis of the rotation valve, for connecting the first or the second passageway to the third passageway,

wherein the portion and the horizontal passageway are formed so as to be vertically aligned with each other at the same angular position when viewed from above along the axis of the rotation valve, and

wherein the switching mechanism continuously rotates in one direction to switch a flow path of the excited first gas into the processing vessel, when the first passageway is aligned with the peripheral opening of the horizontal passageway and not with the annular passageway, or into the bypass line, when the first passageway is aligned with the annular passageway and not with the peripheral opening, and to supply the second gas into the processing vessel, when second passageway is aligned with the peripheral opening of the horizontal passageway, thereby alternately supplying the excited first gas and the second gas through the third passageway into the processing vessel.

2. The processing apparatus of claim 1, wherein while the processing vessel is exhausted, the excited first gas flows into the bypass line and the supplying of the second gas is stopped.

3. The processing apparatus of claim 2, wherein during one rotation of the switching mechanism sequentially exhausts the processing vessel, supplies only the second gas, exhausts the processing vessel again, and supplies only the excited first gas.

4. The processing apparatus of claim 1, wherein while the excited first gas flows into the processing vessel, the supplying of the second gas is stopped, and

wherein while the second gas is supplied into the processing vessel, the excited first gas flows into the bypass line.

5. The processing apparatus of claim 1, wherein the first passageway includes and connects with a first and a second opening and the second passageway has a third opening, the first to third openings being formed on the cylinder.

6. The processing apparatus of claim 5, wherein the annular passageway connects the first opening to the bypass line depending on a rotational position of the rotation valve.

7. The processing apparatus of claim 6,

wherein while the central passageway connects the second opening to the third passageway, the central passageway does not connect the third opening to the third passageway, and

wherein while the central passageway connects the third opening to the third passageway, the central passageway does not connect the second opening to the third passageway and the annular passageway connects the first opening to the bypass line.

8. The processing apparatus of claim 5, wherein the central passageway connects the second or the third opening to the third passageway depending on a rotational position of the rotation valve.

9. The processing apparatus of claim 1, wherein the first passageway is aligned with one of the annular passageway and the central passageway.