Method and system for controlling radical distribution
First Claim
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1. A plasma processing system comprising:
- a processing chamber;
a substrate holder configured to hold a substrate for plasma processing;
a gas injection assembly including a central region and a peripheral region, the gas injection assembly comprising;
a gas injection assembly evacuation port, limited to the central region of the gas injection assembly, including a baffle plate including at least two openings and configured to evacuate gases from a central region of the substrate, anda gas injection system, including a plurality of gas injection ports, configured to inject gases in said process chamber, each of the plurality of gas injection ports being radially outward from every one of the at least two openings of the gas injection assembly evacuation port; and
a chamber evacuation port configured to evacuate gases from a peripheral region surrounding said central region of the substrate.
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Abstract
A plasma processing system includes a processing chamber, a substrate holder configured to hold a substrate for plasma processing, and a gas injection assembly. The gas injection assembly includes a first evacuation port located substantially in a center of the gas injection assembly and configured to evacuate gases from a central region of the substrate, and a gas injection system configured to inject gases in the process chamber. The plasma processing system also includes a second evacuation port configured to evacuate gases from a peripheral region surrounding the central region of the substrate.
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Citations
17 Claims
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1. A plasma processing system comprising:
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a processing chamber; a substrate holder configured to hold a substrate for plasma processing; a gas injection assembly including a central region and a peripheral region, the gas injection assembly comprising; a gas injection assembly evacuation port, limited to the central region of the gas injection assembly, including a baffle plate including at least two openings and configured to evacuate gases from a central region of the substrate, and a gas injection system, including a plurality of gas injection ports, configured to inject gases in said process chamber, each of the plurality of gas injection ports being radially outward from every one of the at least two openings of the gas injection assembly evacuation port; and a chamber evacuation port configured to evacuate gases from a peripheral region surrounding said central region of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A plasma processing system comprising:
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a processing chamber configured to contain a plasma therein; a substrate holder configured to hold a substrate for plasma processing; means for evacuating a central region of said processing chamber; gas injection assembly including; an evacuation port in a central region of the gas injection assembly and coupled to a baffle plate including, at least two openings, and a plurality of gas injection ports in the central region and a peripheral region of the gas injection assembly, each of the plurality of gas injection ports being radially outward from the evacuation port and the at least two openings of the baffle plate coupled thereto; and means for evacuating a peripheral region of said processing chamber. - View Dependent Claims (17)
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Specification