Image sensor for detecting wide spectrum and method of manufacturing the same
First Claim
1. An image sensor for detecting a wide spectrum comprising:
- a multi-layer micro bolometer structure including a multi-layer micro bolometer and two shield layers, wherein the multi-layer micro bolometer include a first detector including an absorber for absorbing light and converting the light into heat and a resistor whose resistance varies according to a change in temperature of the absorber, a first thermal sink separated by an empty space from the lower surface of the first detector, and a second detector having the same structure as a structure of the first detector and separated by an empty space from the lower surface of the first thermal sink, the two shield layers respectively positioned over and below the multi-layer micro bolometer and made of a silicon layer and an oxide layer, and the multi-layer micro bolometer is repeatedly formed one or more times in such a manner that each multi-layer micro bolometer is divided by a shield layer, thereby forming a multi-layer structure; and
a transistor layer applied on the multi-layer micro bolometer structure, electrically connected to the first detector and the second detector, and processing signals detected by the first detector and the second detector.
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Abstract
An image sensor for detecting a wide spectrum includes a plurality of infrared ray receiving layers which individually receive infrared rays having different wavelengths for each pixel, the plurality of infrared ray receiving layers stacked to each other. The image sensor, which is an integrated image sensor where at least two micro bolometers are stacked, acquires spectrum information about visible rays and near-infrared rays as well as two or more infrared rays applied on an object, without mechanical/thermal/optical distortion, and provides the spectrum information to a silicon-based semiconductor such as a photodiode, thereby improving photoelectric conversion efficiency.
55 Citations
16 Claims
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1. An image sensor for detecting a wide spectrum comprising:
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a multi-layer micro bolometer structure including a multi-layer micro bolometer and two shield layers, wherein the multi-layer micro bolometer include a first detector including an absorber for absorbing light and converting the light into heat and a resistor whose resistance varies according to a change in temperature of the absorber, a first thermal sink separated by an empty space from the lower surface of the first detector, and a second detector having the same structure as a structure of the first detector and separated by an empty space from the lower surface of the first thermal sink, the two shield layers respectively positioned over and below the multi-layer micro bolometer and made of a silicon layer and an oxide layer, and the multi-layer micro bolometer is repeatedly formed one or more times in such a manner that each multi-layer micro bolometer is divided by a shield layer, thereby forming a multi-layer structure; and a transistor layer applied on the multi-layer micro bolometer structure, electrically connected to the first detector and the second detector, and processing signals detected by the first detector and the second detector. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of manufacturing an image sensor, comprising:
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forming a buffer oxide layer and a dielectric layer sequentially on an upper surface of a handle wafer, thus preparing a working substrate; forming a first oxide layer, a first absorber, a first resistor, a second oxide layer, a first thermal sink, a third oxide layer, a second absorber, a second resistor, and a fourth oxide layer, sequentially, on the dielectric layer which is a top layer of the working substrate, thus forming a multi-layer micro bolometer, wherein the multi-layer micro bolometer is repeatedly formed one or more times to form a multi-layer bolometer structure; forming a silicon-on-insulator (SOI) thin layer on the multi-layer micro bolometer structure; forming a transistor circuit on the SOI thin layer; electrically connecting the transistor circuit to the first resistor and the second resistor; and forming a metal layer including a bump on the transistor circuit. - View Dependent Claims (16)
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Specification