Semiconductor device and method for forming the same
First Claim
1. A semiconductor device comprising:
- a thin film transistor comprising;
a semiconductor layer formed on an insulating surface;
a first impurity region and a second impurity region formed in the semiconductor layer;
a channel region formed between the first impurity region and the second impurity region;
a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region;
a gate electrode formed over the semiconductor layer with a gate insulating film interposed therebetween;
a first side wall and a second side wall adjacent to the gate electrode with a first insulating film interposed between the first side wall and the gate electrode;
a second insulating film formed over the gate electrode, the first insulating film, the first side wall and the second side wall; and
an electrode formed over the second insulating film and electrically connected to the first metal silicide region,wherein the first metal silicide region is isolated from the insulating surface by the first impurity region and the second metal silicide region is isolated from the insulating surface by the second impurity region, andwherein a maximum width of the first side wall in a channel direction is larger than a thickness of the first insulating film.
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Abstract
A thin film transistor device reduced substantially in resistance between the source and the drain by incorporating a silicide film, which is fabricated by a process comprising forming a gate insulator film and a gate contact on a silicon substrate, anodically oxidizing the gate contact, covering an exposed surface of the silicon semiconductor with a metal, and irradiating an intense light such as a laser beam to the metal film either from the upper side or from an insulator substrate side to allow the metal coating to react with silicon to obtain a silicide film. The metal silicide layer may be obtained otherwise by tightly adhering a metal coating to the exposed source and drain regions using an insulator formed into an approximately triangular shape, preferably 1 μm or less in width, and allowing the metal to react with silicon.
75 Citations
45 Claims
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1. A semiconductor device comprising:
a thin film transistor comprising; a semiconductor layer formed on an insulating surface; a first impurity region and a second impurity region formed in the semiconductor layer; a channel region formed between the first impurity region and the second impurity region; a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region; a gate electrode formed over the semiconductor layer with a gate insulating film interposed therebetween; a first side wall and a second side wall adjacent to the gate electrode with a first insulating film interposed between the first side wall and the gate electrode; a second insulating film formed over the gate electrode, the first insulating film, the first side wall and the second side wall; and an electrode formed over the second insulating film and electrically connected to the first metal silicide region, wherein the first metal silicide region is isolated from the insulating surface by the first impurity region and the second metal silicide region is isolated from the insulating surface by the second impurity region, and wherein a maximum width of the first side wall in a channel direction is larger than a thickness of the first insulating film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A semiconductor device comprising:
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an N-type thin film transistor comprising; a first semiconductor layer formed on an insulating surface; a first impurity region and a second impurity region formed in the first semiconductor layer; a first channel region formed between the first impurity region and the second impurity region; a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region; a first gate electrode formed over the first semiconductor layer with a first gate insulating film interposed therebetween; a first side wall and a second side wall adjacent to the first gate electrode with a first insulating film interposed between the first side wall and the first gate electrode; a second insulating film formed over the first gate electrode, the first insulating film, the first side wall and the second side wall; and a first electrode formed over the second insulating film and electrically connected to the first metal silicide region, and a P-type thin film transistor comprising; a second semiconductor layer formed on the insulating surface; a third impurity region and a fourth impurity region formed in the second semiconductor layer; a second channel region formed between the third impurity region and the fourth impurity region; a third metal silicide region formed on the third impurity region and a fourth metal silicide region formed on the fourth impurity region and; a second gate electrode formed over the second semiconductor layer with a second gate insulating film interposed therebetween; a third side wall and a fourth side wall adjacent to the second gate electrode with a third insulating film interposed between the third side wall and the second gate electrode; a fourth insulating film formed over the second gate electrode, the third insulating film, the third side wall and the fourth side wall; and a second electrode formed over the fourth insulating film and electrically connected to the third metal silicide region, wherein the first metal silicide region is isolated from the insulating surface by the first impurity region, the second metal silicide region is isolated from the insulating surface by the second impurity region, the third metal silicide region is isolated from the insulating surface by the third impurity region and the fourth metal silicide region is isolated from the insulating surface by the fourth impurity region wherein a maximum width of the third side wall in a second channel direction is larger than a thickness of the third insulating film. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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20. A semiconductor device comprising:
a thin film transistor comprising; a semiconductor layer formed on an insulating surface; a first impurity region and a second impurity region formed in the semiconductor layer; a channel region formed between the first impurity region and the second impurity region; a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region; a gate electrode formed over the semiconductor layer with a gate insulating film interposed therebetween; a first side wall and a second side wall adjacent to the gate electrode with a first insulating film interposed between the first side wall and the gate electrode; a second insulating film formed over the gate electrode, the first insulating film, the first side wall and the second side wall; and an electrode formed over the second insulating film and electrically connected to the first metal silicide region, wherein the first impurity region overlaps with the first side wall and the second impurity region overlaps with the second side wall and, wherein the first metal silicide region is isolated from the channel region by the first impurity region and the second metal silicide region is isolated from the channel region by the second impurity region, and wherein a maximum width of the first side wall in a channel direction is larger than a thickness of the first insulating film. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28)
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29. A semiconductor device comprising:
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an N-type thin film transistor comprising; a first semiconductor layer formed on an insulating surface; a first impurity region and a second impurity region formed in the first semiconductor layer; a first channel region formed between the first impurity region and the second impurity region; a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region; a first gate electrode formed over the first semiconductor layer with a first gate insulating film interposed therebetween; a first side wall and a second side wall adjacent to the first gate electrode with a first insulating film interposed between the first side wall and the first gate electrode; a second insulating film formed over the first gate electrode, the first insulating film, the first side wall and the second side wall; and a first electrode formed over the second insulating film and electrically connected to the first metal silicide region, and a P-type thin film transistor comprising; a second semiconductor layer formed on the insulating surface; a third impurity region and a fourth impurity region formed in the second semiconductor layer; a second channel region formed between the third impurity region and the fourth impurity region; a third metal silicide region formed on the third impurity region and a fourth metal silicide region formed on the fourth impurity region and; a second gate electrode formed over the second semiconductor layer with a second gate insulating film interposed therebetween; a third side wall and a fourth side wall adjacent to the second gate electrode with a third insulating film interposed between the third side wall and the second gate electrode; a fourth insulating film formed over the second gate electrode, the third insulating film, the third side wall and the fourth side wall; and a second electrode formed over the fourth insulating film and electrically connected to the third metal silicide region, wherein the first impurity region overlaps with the first side wall, the second impurity region overlaps with the second side wall, the third impurity region overlaps with the third side wall and the fourth impurity region overlaps with the fourth side wall, wherein the first metal silicide region is isolated from the first channel region by the first impurity region, the second metal silicide region is isolated from the first channel region by the second impurity region, the third metal silicide region is isolated from the second channel region by the third impurity region and the fourth metal silicide region is isolated from the second channel region by the fourth impurity region, wherein a maximum width of the third side wall in a second channel direction is larger than a thickness of the third insulating film. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36)
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37. A semiconductor device comprising:
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an N-type thin film transistor comprising; a first semiconductor layer formed on an insulating surface; a first impurity region and a second impurity region formed in the first semiconductor layer; a first channel region formed between the first impurity region and the second impurity region; a first metal silicide region formed on the first impurity region and a second metal silicide region formed on the second impurity region; a first gate electrode formed over the first semiconductor layer with a first gate insulating film interposed therebetween; a first side wall and a second side wall adjacent to the first gate electrode with a first insulating film interposed between the first side wall and the first gate electrode; a second insulating film formed over the first gate electrode, the first insulating film, the first side wall and the second side wall; and a first electrode formed over the second insulating film and electrically connected to the first metal silicide region, and a P-type thin film transistor comprising; a second semiconductor layer formed on the insulating surface; a third impurity region and a fourth impurity region formed in the second semiconductor layer; a second channel region formed between the third impurity region and the fourth impurity region; a third metal silicide region formed on the third impurity region and a fourth metal silicide region formed on the fourth impurity region and; a second gate electrode formed over the second semiconductor layer with a second gate insulating film interposed therebetween; a third side wall and a fourth side wall adjacent to the second gate electrode with a third insulating film interposed between the third side wall and the second gate electrode; a fourth insulating film formed over the second gate electrode, the third insulating film, the third side wall and the fourth side wall; and a second electrode formed over the fourth insulating film and electrically connected to the third metal silicide region, wherein the first metal silicide region, the second metal silicide region, the third silicide region and the fourth metal silicide region comprise same metal elements, wherein a maximum width of the third side wall in a second channel direction is larger than a thickness of the third insulating film. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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Specification