Electrically programmable reticle and system
First Claim
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1. An electrically programmable reticle comprising:
- an electrochromatic layer having a substantially reflective area and a substantially opaque area, wherein said substantially reflective area is in response to a first electric field, and further wherein said substantially opaque area is in response to a second electric field.
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Abstract
An electrically programmable reticle is made using at least one electrochromatic layer that changes its optical transmissibility in response to applied voltages. Transparent conductor layers are configured to the desired patterns. The electrically programmable reticles are either patterned in continuous forms that have separately applied voltages or in a matrix of rows and columns that are addressed by row and column selects such that desired patterns are formed with the application of a first voltage level and reset with the application of a second voltage level.
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Citations
25 Claims
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1. An electrically programmable reticle comprising:
an electrochromatic layer having a substantially reflective area and a substantially opaque area, wherein said substantially reflective area is in response to a first electric field, and further wherein said substantially opaque area is in response to a second electric field. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithography system comprising:
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a light source; and an electrocbromatic reticle positioned to receive light transmitted by said light source, wherein said electrochromatic reticle includes a substantially opaque region in response to a first signal and a substantially transparent region in response to a second signal. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of manufacturing a semiconductor device using a programmable reticle, said method comprising:
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providing a first voltage to a first portion of an electrochromatic layer of said programmable reticle resulting in said first portion having substantial transparency; providing a second voltage to a second portion of said electrochromatic layer of said programmable reticle resulting in said second portion having substantial opaqueness; directing a beam at a portion of a wafer upon which said semiconductor device is formed through said programmable reticle. - View Dependent Claims (22, 23, 24, 25)
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Specification