Silicon crystallization apparatus and silicon crystallization method thereof
First Claim
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1. A stage for crystallization comprising:
- a moving stage that can move in a horizontal direction;
a fixing plate provided in the moving stage, the fixing plate configured to fix a substrate;
a rotating frame provided in the moving stage, the rotating frame configured to rotate the fixing plate;
a plurality of adsorption pins provided in the fixing plate, the adsorption pins capable of being moved up and down, wherein the adsorption pins are capable of adsorbing the substrate;
a vacuum groove formed in a surface of the fixing plate, the vacuum groove capable of adsorbing the substrate;
an optical device configured to crystallize silicon by irradiating laser beams to the substrate; and
a sensing device provided in the optical device, the sensing device facing toward an edge of the substrate to directly sense the edge of the substrate, and configured to control the movement of the moving stage, the fixing plate and the rotating frame to align the substrate.
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Abstract
A novel silicon crystallization apparatus and a silicon crystallization method renders it is possible to form alignment key without additional photolithography, and to adjust a substrate to a correct position by sensing a deviation of the substrate when the substrate is loaded. The silicon crystallization apparatus includes a moving stage being moved in a horizontal direction, and a fixing plate provided in the moving stage, to fix a substrate. A rotating frame is provided in the moving stage, to rotate the fixing plate.
12 Citations
15 Claims
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1. A stage for crystallization comprising:
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a moving stage that can move in a horizontal direction; a fixing plate provided in the moving stage, the fixing plate configured to fix a substrate; a rotating frame provided in the moving stage, the rotating frame configured to rotate the fixing plate; a plurality of adsorption pins provided in the fixing plate, the adsorption pins capable of being moved up and down, wherein the adsorption pins are capable of adsorbing the substrate; a vacuum groove formed in a surface of the fixing plate, the vacuum groove capable of adsorbing the substrate; an optical device configured to crystallize silicon by irradiating laser beams to the substrate; and a sensing device provided in the optical device, the sensing device facing toward an edge of the substrate to directly sense the edge of the substrate, and configured to control the movement of the moving stage, the fixing plate and the rotating frame to align the substrate. - View Dependent Claims (2, 3, 4, 5)
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6. A silicon crystallization apparatus comprising:
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a stage configured to fix a substrate having silicon deposited thereon, the stage being rotatably and movably provided with the substrate in a horizontal direction; an optical device for crystallizing the silicon by irradiating laser beams to the substrate; and a sensing device provided in the optical device, the sensing device facing toward an edge of the substrate to directly sense the edge of the substrate, and configured to control the movement of the stage to align the substrate, the stage including; a moving stage configured to move in a horizontal direction; a fixing plate provided in the moving stage so as to fix the substrate; a rotating frame provided in the moving stage so as to rotate the fixing plate; a plurality of adsorption pins provided in the fixing plate, the adsorption pins capable of being moved up and down, wherein the adsorption pins are capable of adsorbing the substrate; and a vacuum groove provided in the surface of the fixing plate. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification