Method and apparatus of forming alignment layer for liquid crystal display device
First Claim
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1. A method for forming an alignment layer of an LCD device comprising:
- preparing a substrate;
coating an alignment material on the substrate, for initial alignment of liquid crystal;
applying a field flux to the alignment material, for determination of alignment direction of the alignment material;
curing the alignment material by using a heater at a temperature below 100°
C.,wherein applying the field flux is performed with the field flux application direction parallel to the X-axis, perpendicular to the X-axis, or diagonal to the X-axis depending on the alignment direction of the alignment material, andchanging a direction of the field flux by rotating a field flux generator while maintaining the substrate stationary or by rotating the substrate while maintaining the field flux generator stationary.
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Abstract
A method for forming an alignment layer is disclosed, to prevent light leakage generated by a physical contact between a rubbing roll and a substrate, which includes preparing a substrate; coating an alignment material on the substrate, for initial alignment of liquid crystal; applying an electric field or a magnetic field to the alignment material, for determination of alignment direction in the alignment material; and curing the alignment material.
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Citations
17 Claims
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1. A method for forming an alignment layer of an LCD device comprising:
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preparing a substrate; coating an alignment material on the substrate, for initial alignment of liquid crystal; applying a field flux to the alignment material, for determination of alignment direction of the alignment material; curing the alignment material by using a heater at a temperature below 100°
C.,wherein applying the field flux is performed with the field flux application direction parallel to the X-axis, perpendicular to the X-axis, or diagonal to the X-axis depending on the alignment direction of the alignment material, and changing a direction of the field flux by rotating a field flux generator while maintaining the substrate stationary or by rotating the substrate while maintaining the field flux generator stationary. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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Specification