Reflective loop system producing incoherent radiation

• US 7,728,954 B2
• Filed: 06/06/2006
• Issued: 06/01/2010
• Est. Priority Date: 06/06/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV), Dainippon Screen Manufacturing Company Limited (SCREEN Holdings Co., Ltd.)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Ueyama, Kenji, Baselmans, Johannes Jacobus Matheus
• Primary Examiner(s): Epps; Georgia Y
• Assistant Examiner(s): HOWARD, RYAN D
• Application Number:
  US11/447,289
• Publication Number:
  US 20070279611A1
• Time in Patent Office: 1,456 Days
• Field of Search: 355/53, 355/67, 372/25, 372/700
• US Class Current: 355/67
• CPC Class Codes: G02B 27/48 Laser speckle optics
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Abstract

A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system received the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively through non-overlapping loops, to form an incoherent beam.

Claims

1. A system, comprising:

a source of radiation that produces a coherent or partially coherent beam; and

a reflective loop system comprising a reflective device comprising at least one opening,

wherein the reflective device is configured to reflect the coherent or partially coherent beam through one or more loops, each of the loops comprising four reflections, to form a more incoherent beam,

wherein the beam enters or exits the reflective loop system through the at least one opening, and

wherein the reflective loop system includes a field plane and a pupil plane.

2. The system of claim 1, wherein the reflective loop system comprises a first and second reflective device.

3. The system of claim 2, wherein the first and second reflective devices are both curved.

4. The system of claim 2, wherein at least one of the first and second reflective devices comprises first and second portions and at least one of the first and second portions is misaligned with respect to respective reflective surfaces of the first and second reflective devices.

5. The system of claim 1, wherein the reflective loop system comprises second through fourth reflective devices.

6. The system of claim 5, wherein the four reflective devices comprise three planar reflective devices and a curved reflective device.

7. The system of claim 1, wherein the reflective loop system comprises reflective devices having respective reflective surfaces that are tilted with respect to each other, such that non-overlapping loops are formed.

8. The system of claim 1, wherein:

the partially coherent beam is in-coupled into the reflective loop system using a first optical device; and

the incoherent beam is out-coupled from the reflective loop system using a second optical device.

9. The system of claim 1, wherein the reflective loop system includes two field planes and two pupil planes.

10. The system of claim 1, wherein the reflective loop system further comprises:

a second reflective device associated with a field of the reflective loop system; and

a third reflective device associated with a pupil of the reflective loop system,

wherein a position of the field or the pupil is changed based on misalignment between respective reflective surfaces of the second and third reflective devices.

11. The system of claim 1, wherein the reflective loop system is configured such that after each loop a first portion of the incoherent beam is transmitted from the reflective loop system and a remaining portion of the incoherent beam is directed along another one of the loops.

12. The system of claim 1, wherein:

the incoherent beam is transmitted though one of a pupil or field of the reflective loop system; and

the at least partially coherent beam is received at the other one of the pupil or field of the reflective loop system.

13. The system of claim 1, further comprising:

a patterning device that patterns the incoherent beam; and

a projection system that projects the incoherent beam onto a target portion of a substrate.

14. The system of claim 13, further comprising:

an illumination system that processes the incoherent beam and directs the incoherent beam onto the patterning device.

15. The system of claim 14, wherein the illumination system comprises the radiation source and the reflective loop system.

16. The system of claim 1, wherein a path length the loop is larger than a temporal coherence length of the at least partially coherent beam.

17. The system of claim 1, further comprising:

one or more additional reflective loop systems that are configured to receive a respective incoherent beam from an upstream reflective loop system and reflect the incoherent beam through a loop to form another incoherent beam.

18. A lithography system, comprising:

an illumination system that generates an illumination beam of radiation, comprising,

a source of radiation, and

a reflective loop system comprising a reflective device comprising at least one opening,

wherein the reflective device is configured to reflect a partially coherent beam through one or more loops, each of the loops comprising four reflections, to form a more incoherent beam,

wherein the beam enters or exits the reflective loop system through the at least one opening;

a patterning device that patterns the illumination beam of radiation; and

a projection system that projects the patterned beam onto a target portion of a substrate.

19. The lithography system of claim 18, wherein the reflective loop system is configured such that after each loop a first portion of the incoherent beam is transmitted from the reflective loop system and a remaining portion of the incoherent beam is directed along another one of the loops.

20. The lithography system of claim 18, wherein the reflective loop system comprises the reflective device and one or more additional reflective devices having respective reflective surfaces that are tilted with respect to each other, such that non-overlapping loops paths are formed.

21. A device manufacturing method, comprising:

using a reflective loop system comprising a reflective device comprising at least one opening, wherein the reflective device is configured to reflect a coherent or partially coherent beam through one or more loops to form an incoherent beam, each of the loops comprising four reflections, wherein the beam enters or exits the reflective loop system through the at least one opening;

forming an illumination beam from the incoherent beam;

patterning the illumination beam; and

projecting the patterned illumination beam onto a target portion of a substrate.

22. The method of claim 21, wherein after each loop a first portion of the incoherent beam is formed into the illumination beam used in the forming and a remaining portion of the incoherent beam is directed along another one of the loops.

23. The method of claim 21, wherein the using step comprises tilting respective reflective surface of reflective devices with respect to each other to form non-overlapping loop paths.

24. A laser that outputs an incoherent output beam, comprising:

a source of radiation that produces a coherent or partially coherent beam; and

a reflective loop system comprising a reflective device comprising at least one opening,

wherein the reflective device is configured to receive the coherent or partially coherent beam and reflect the partially coherent beam through one or more loops, each of the loops comprising four reflections, to form the incoherent output beam,

wherein the beam enters or exits the reflective loop system through the at least one opening, and

wherein the reflective loop system includes a field plane and a pupil plane.

25. The laser of claim 24, wherein the reflective loop system is configured such that after each loop a first portion of the incoherent beam is transmitted from the reflective loop system and a remaining portion of the incoherent beam is directed along another one of the loops.

26. The laser of claim 24, wherein the reflective loop system comprises the reflective device and one or more additional reflective devices having respective reflective surfaces that are tilted with respect to each other, such that non-overlapping loops paths are formed.

27. An illuminator that outputs an incoherent illumination beam, comprising:

a source of radiation that produces a coherent or partially coherent beam; and

a reflective loop system comprising a reflective device comprising at least one opening,

wherein the reflective device is configured to receive the partially coherent beam and reflect the partially coherent beam through one or more loops, each of the loops comprising four reflections, to form the incoherent illumination beam,

wherein the beam enters or exits the reflective loop system through the at least one opening, and

wherein the reflective loop system includes a field plane and a pupil plane.

28. The illuminator of claim 27, wherein the reflective loop system is configured such that after each loop a first portion of the incoherent beam is transmitted from the reflective loop system and a remaining portion of the incoherent beam is directed along another one of the loops.

29. The illuminator of claim 27, wherein the reflective loop system comprises the reflective device and one or more additional reflective devices having respective reflective surfaces that are tilted with respect to each other, such that non-overlapping loops paths are formed.