Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data

• US 7,728,956 B2
• Filed: 04/05/2005
• Issued: 06/01/2010
• Est. Priority Date: 04/05/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Troost, Kars Zeger, Maas, Adrianus Johannes Henricus, Bleeker, Arno Jan
• Primary Examiner(s): Glick; Edward J
• Assistant Examiner(s): LIU, MICHAEL
• Application Number:
  US11/098,607
• Publication Number:
  US 20060221320A1
• Time in Patent Office: 1,883 Days
• Field of Search: 355/53, 355/67, 355/77, 250/548, 430/5, 430/20, 430/30
• US Class Current: 355/77
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A lithographic system and method are provided that allow for variations of a basic device design to be generated without substantially increasing the cost of the data path hardware. The lithographic apparatus includes an array of individually controllable elements, a control system, a first data buffer, and a second data buffer. The control system provides control signals to the array of individually controllable elements. The first data buffer stores pattern data that corresponds to a pattern to be exposed on a plurality of areas on the substrate. The second data buffer stores pattern variation data, corresponding to at least one change to a part of the pattern. The control system is configured, such that at least one variation of the pattern is exposed on one of the areas on the substrate with the pattern variation data.

Claims

1. A device manufacturing method, comprising:

modulating a beam of radiation using an array of individually controllable elements, wherein a control system is used to provide control signals to the array of individually controllable elements;

storing pattern data in a first buffer, wherein the pattern data corresponds to a first device to be exposed on the substrate;

providing the control signals to the array of individually controllable elements, such that the beam of radiation is modulated by the pattern data;

projecting the modulated beam of radiation onto a substrate to expose the first device on the substrate;

storing in a second data buffer pattern variation data corresponding to at least one change to a part of the pattern data stored in the first data buffer;

modifying the pattern data of the first data buffer using the pattern variation data of the second data buffer to generate modified pattern data, which corresponds to a second pattern of a second device to be exposed on the substrate;

providing the control signals to the array of individually controllable elements, such that the beam of radiation is modulated by;

projecting the modulated beam of radiation onto the substrate to expose the second device on the substrate; and

testing the first and the second devices to determine an optimal pattern for a device.

2. The method of claim 1, wherein the first and second data buffers are independent data buffers.

3. The method claim 1, wherein the first and second data buffers are allocated portions of a combined data buffer.

4. The method claim 1, wherein the modifying comprises replacing part of the pattern data stored in the first data buffer with at least a portion of the pattern variation data.

5. The method claim 1, wherein:

the pattern variation data comprises modification instructions; and

the modifying comprises;

modifying the pattern data stored in the first data buffer according to information defined by the modification instructions.

6. The method of claim 1, wherein the projecting the modulated beam of radiation onto the substrate to expose the first device on the substrate comprises:

projecting the modulated beam of radiation onto the substrate to expose a pixel or a memory cell on the substrate.

7. The method of claim 1, wherein:

the pattern variation data comprises a plurality of pattern stripes to be exposed by a series of successive exposures; and

the projecting the modulated beam of radiation onto the substrate to expose the second device on the substrate comprises;

consecutively projecting the modulated beam of radiation onto the substrate to expose the plurality of pattern stripes at each area of the plurality of areas of the substrate on which the first device is to be exposed.

8. A computer program product comprising a computer useable medium having a computer program logic recorded thereon for controlling at least one processor, the computer program logic comprising:

computer program code means for modulating a beam of radiation using an array of individually controllable elements, wherein a control system is used to provide control signals to the array of individually controllable elements;

computer program code means for storing pattern data in a first buffer, wherein the pattern data corresponds to a first pattern of a first device to be exposed on a plurality of areas on the substrate;

computer program code means for storing pattern variation data corresponding to at least one change to a part of the pattern data in the first data buffer;

computer program code means for modifying the pattern data of the first data buffer using the pattern variation data of the second data buffer to generate modified pattern data, which corresponds to a second pattern of a second device to be exposed on the substrate;

computer program code means for providing control signals to the array of individually controllable elements, such that patterned beams corresponding to the first device and the second device are formed;

computer program code means for causing the patterned beams to be projected onto a substrate to expose the first device and the second device on respective areas on the substrate; and

computer program code means for testing the first and the second devices to determine an optimal pattern for a device.

9. The computer program product of claim 8, wherein the first and second data buffers are independent data buffers.

10. The computer program product of claim 8, wherein the first and second data buffers are allocated portions of a combined data buffer.

11. The computer program product of claim 8, wherein the computer program code means for modifying comprises computer program code means for replacing part of the pattern data stored in the first data buffer with at least a portion of the pattern variation data.

12. The computer program product of claim 8, wherein:

the pattern variation data comprises modification instructions; and

the computer program code means for modifying comprises;

computer program code means for modifying the pattern data stored in the first data buffer according to information defined by the modification instructions.

13. The computer program product of claim 8, wherein the computer program code means for causing the patterned beams to be projected comprises:

computer program code means for causing the pattern beams to be projected onto the substrate to expose a pixel or a memory cell on the substrate.

14. The computer program product of claim 8, wherein:

the pattern variation data comprises a plurality of pattern stripes to be exposed by a series of successive exposures; and

the computer program code means for causing the patterned beams to be projected comprises;

computer program code means for causing the pattern beams to be consecutively projected onto the substrate to expose the plurality of pattern stripes at each area of the plurality of areas of the substrate on which the first device is to be exposed.

15. A process, comprising:

controlling an array of individually controllable elements, wherein the controlling is performed through using,

pattern data corresponding to a first pattern of a first device to be exposed on a plurality of areas on a substrate, the pattern data being stored in a first data buffer; and

pattern variation data corresponding to at least one change to a part of the pattern data used to form a second device, the pattern variation data being stored in a second data buffer;

exposing the first device and the second device on respective areas of a substrate; and

testing the first and the second devices to determine an optimal pattern for a device.

16. The process of claim 15, wherein the first and second data buffers are independent data buffers.

17. The process of claim 15, wherein the first and second data buffers are allocated portions of a combined data buffer.

18. The process of claim 15, wherein the controlling comprises replacing part of the pattern data stored in the first data buffer with at least a portion of the pattern data.

19. The process of claim 15, wherein:

the pattern variation data comprises modification instructions; and

the controlling comprises;

modifying the pattern data stored in the first data buffer according to information defined by the modification instructions corresponding to the pattern variation data for the exposure of the second device on the substrate.

20. The process of claim 15, wherein:

the pattern variation data comprises a plurality of pattern stripes to be exposed by a series of successive exposures; and

the exposing comprises;

consecutively projecting the modulated beam of radiation onto the substrate to expose the plurality of pattern stripes at each area of the plurality of areas of the substrate on which the first device is to be exposed.