Integrated chemical microreactor with large area channels and manufacturing process thereof

• US 7,732,192 B2
• Filed: 05/01/2007
• Issued: 06/08/2010
• Est. Priority Date: 02/29/2000
• Status: Expired due to Term

• Current Assignee: STMicroelectronics SRL (STMicroelectronics NV)
• Original Assignee: STMicroelectronics SRL (STMicroelectronics NV)
• Inventors: Barlocchi, Gabriele, Mastromatteo, Ubaldo, Villa, Flavio Francesco
• Primary Examiner(s): Beisner; William H
• Assistant Examiner(s): HOBBS, MICHAEL L
• Application Number:
  US11/743,062
• Publication Number:
  US 20070252224A1
• Time in Patent Office: 1,134 Days
• Field of Search: 438/49, 257/E21.1, 257/E29.1, 435/287.2
• US Class Current: 435/287.2
• CPC Class Codes: B01J 19/0093 Microreactors, e.g. miniaturised or microfabricated reactors laboratory containers with capillary fluid transport in microfabricated channels or chambers B01L3/5027
• CPC Class Codes: B01J 2219/00783 Laminate assemblies, i.e. the reactor comprising a stack of plates
• CPC Class Codes: B01J 2219/00828 Silicon wafers or plates
• CPC Class Codes: Y10T 436/114998 with treatment or replacement of aspirator element [e.g., cleaning, etc.]

Abstract

The microreactor has a body of semiconductor material; a large area buried channel extending in the body and having walls; a coating layer of insulating material coating the walls of the channel; a diaphragm extending on top of the body and upwardly closing the channel. The diaphragm is formed by a semiconductor layer completely encircling mask portions of insulating material.

Claims

1. An integrated microreactor comprising:

a) a body of semiconductor material;

b) a channel in said body and having walls and a coating layer of insulating material coating said walls;

c) a diaphragm upwardly closing said channel, said diaphragm comprising a semiconductor layer completely encircling mask portions of insulating material, wherein said semiconductor layer is surrounded by an oxide layer;

d) a structural layer extending on top of said body and said diaphragm;

e) a reservoir layer extending on top of said structural layer and a first reservoir extending through said reservoir layer as far as said structural layer; and

f) a first aperture extending through said structural layer and connecting said first reservoir with said channel.

2. The integrated microreactor of claim 1, wherein said channel has a width ≧

200 μ

m.

3. The integrated microreactor of claim 2, wherein said channel has a width between 200 μ

m and 500 μ

m.

4. The integrated microreactor of claim 1, further comprising:

a) a second reservoir extending through said reservoir layer as far as said structural layer; and

b) a second aperture extending through said structural layer and connecting said second reservoir with said channel.

5. The integrated microreactor of claim 1, wherein said body is of monocrystalline silicon and said coating layer is of oxide.

6. The integrated microreactor of claim 4, wherein said body is of monocrystalline silicon and said coating layer is of oxide.

7. The integrated microreactor of claim 1, wherein said structural layer is a pseudo epitaxial layer.

8. A method of performing a biological test, wherein a biological fluid is applied to the integrated microreactor of anyone of claims 1-7 and a biological test is performed.

9. The method of claim 8, wherein the biological test is amplification.

10. The method of claim 9, wherein the amplification is DNA amplification.

11. The integrated microreactor of claim 1, further comprising a hole that extends through the diaphragm and into the channel, said hole being coated by the oxide layer and being distinct from said first aperture.

12. The integrated microreactor of claim 4, further comprising a hole that extends through the diaphragm and into the channel, said hole being coated by the oxide layer and being distinct from said first and second apertures.