Wafer process flow for a high performance MEMS accelerometer

• US 7,736,931 B1
• Filed: 07/20/2009
• Issued: 06/15/2010
• Est. Priority Date: 07/20/2009
• Status: Expired due to Fees

• Current Assignee: Rosemount Aerospace, Inc. (Rtx Corporation)
• Original Assignee: Rosemount Aerospace, Inc. (Rtx Corporation)
• Inventors: Guo, Shuwen
• Primary Examiner(s): Ghyka; Alexander G
• Assistant Examiner(s): Nikmanesh; Seahvosh J
• Application Number:
  US12/506,022
• Time in Patent Office: 330 Days
• Field of Search: 438/50, 438/51, 438/52, 257/E21.613
• US Class Current: 438/52
• CPC Class Codes: G01P 15/02 by making use of inertia forces using solid seismic massesG01P15/14 takes precedence
• CPC Class Codes: G01P 15/0802 Details

Abstract

A process for fabricating a pendulous accelerometer, including the steps of: providing a first substrate having a top planar surface, etching a portion of the first substrate to a first predetermined depth from the top planar surface to form a plurality of first protrusions, providing a second substrate, etching a portion of the second substrate to a second predetermined depth to form a plurality of second protrusions, bonding planar surfaces of the first protrusions to planar surfaces of the second protrusions, and etching a portion of the first substrate from an opposite side of the first substrate to a third predetermined depth equal to or greater than the difference between the total thickness of the first substrate and the first predetermined depth to form a freely rotatable sensing plate that includes a substantially hollow proof mass.

Claims

1. A process for fabricating a pendulous accelerometer having a sensing plate with a symmetric plate area and an asymmetric plate mass, the process comprising the steps of:

providing a first substrate having a top planar surface, a bottom planar surface substantially parallel to the top planar surface, and a total thickness extending from the top planar surface to the bottom planar surface;

etching a portion of the first substrate to a first predetermined depth from the top planar surface to form a plurality of first protrusions each having a top planar surface;

providing a second substrate having an upper planar surface;

etching a portion of the second substrate to a second predetermined depth extending from the upper planar surface to form a plurality of second protrusions each having an upper planar surface;

bonding the top planar surface of at least one of the first protrusions to the upper planar surface of at least one of the second protrusions to form an anchor portion; and

etching a portion of the first substrate from the bottom planar surface to a third predetermined depth at least equal to the difference between the total thickness of the first substrate and the first predetermined depth to form a freely rotatable sensing plate having a solid proof mass on a first side of the anchor portion and a substantially hollow proof mass on a second side of the anchor portion.

2. The process of claim 1, wherein the total thickness of the first substrate is approximately 75 μ

m.

3. The process of claim 2, wherein the first predetermined depth is approximately 20 μ

m.

4. The process of claim 3, wherein the third predetermined depth is approximately 55 μ

m.

5. The process of claim 1, further comprising the steps of:

forming a first fixed electrode surface on the second substrate beneath the first side of the sensing plate;

forming a second fixed electrode surface on the second substrate beneath the second side of the sensing plate; and

forming a plurality of protrusions extending upward from each of the fixed electrode surfaces.

6. The process of claim 5, wherein the step of forming the plurality of protrusions includes performing a thermal oxidation process on selected areas of the second substrate to form a plurality of oxide bumps.

7. The process of claim 1, wherein the step of etching a portion of the first substrate from the top planar surface includes the steps of depositing a first masking material on a portion of the top planar surface of the first substrate and photo chemical etching a remaining portion of the first substrate that is not covered by the masking material.

8. The process of claim 7, wherein the step of depositing a first masking material includes depositing a nitride layer using low pressure chemical vapor deposition.

9. The process of claim 8, wherein the step of photo chemical etching of the substrate is performed using potassium hydroxide (KOH).

10. The process of claim 1, wherein the step of providing a second substrate includes providing a silicon-on-insulator substrate having two silicon layers separated by an oxide layer.

11. The process of claim 1, wherein the step of bonding the top planar surface of at least one of the first protrusions to the upper planar surface of at least one of the second protrusions comprises fusion bonding of the planar surfaces.

12. The process of claim 11, further comprising the step of forming alignment marks in an oxide layer disposed on a lower planar surface of the second substrate to aid in alignment of the first substrate with the second substrate during the fusion bonding process.

13. The process of claim 1, wherein the step of etching a portion of the second substrate includes the steps of

depositing a first masking layer using low pressure chemical vapor deposition on a portion of the upper planar surface of the second substrate;

reactive ion etching a portion of the second substrate not covered by the first masking layer to form the plurality of second protrusions;

removing the first masking layer;

depositing a second masking layer on a portion of the second substrate, including each of the plurality of second protrusions; and

deep reactive ion etching the portion of the second substrate not covered by the second masking layer to form a fixed electrode structure extending upward from the oxide layer, wherein the fixed electrode structure has a thickness, as measured from the oxide layer, that is less than the thickness of each of the second protrusions.

14. The process of claim 13, further comprising the step of performing a thermal oxidation process on selected areas of the fixed electrode structure to form a plurality of oxide bumps on the fixed electrode structure.

15. The process of claim 1, further comprising the steps of:

providing a topping wafer;

etching a portion of the topping wafer to form a topping recess; and

bonding the topping wafer to the second substrate such that the freely rotatable

sensing plate is enclosed within the topping recess.

16. The process of claim 15, further comprising depositing a thin film over a portion of the surface of the topping recess by getter sputtering.

17. The process of claim 15, further comprising frit printing a contact surface of the topping wafer.

18. The process of claim 17, wherein the bonding step is accomplished using frit bonding.

19. A process for fabricating a pendulous accelerometer having an asymmetrical sensing plate, the process comprising the steps of:

depositing a first masking material on a portion of a top planar surface of a first substrate, the first substrate having a bottom planar surface substantially parallel to the top planar surface and a total thickness measured from the top planar surface to the bottom planar surface;

etching a remaining portion of the first substrate that is not covered by the masking material to a first predetermined depth measured from the top planar surface to form a plurality of first protrusions having planar surfaces;

depositing a second masking material on a portion of a first planar surface of a second substrate;

etching a remaining portion of the second substrate that is not covered by the masking material to a second predetermined depth measured from the first planar surface to form a plurality of second protrusions each having a planar surface;

bonding the planar surface of at least one of the first protrusions to the planar surface of at least one of the second protrusions to form an anchor portion;

etching the first substrate from the bottom planar surface to a third predetermined depth at least equal to the difference between the total thickness of the first substrate and the first predetermined depth to form a freely rotatable sensing plate having a solid proof mass on a first side of the anchor portion and a substantially hollow proof mass on the second side of the anchor portion.

20. The process of claim 19, wherein the step of etching the first substrate from the bottom planar surface further comprises etching a plurality of hollow cavities in the first substrate to form the substantially hollow proof mass on the second side of the anchor portion.