Contamination barrier with expandable lamellas
First Claim
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1. A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source, the contamination barrier comprising:
- a support structure comprising an inner ring;
a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure; and
a shield configured to shield the inner ring of the support structure from being hit by radiation or debris from the radiation source.
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Abstract
A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
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Citations
21 Claims
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1. A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source, the contamination barrier comprising:
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a support structure comprising an inner ring; a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure; and a shield configured to shield the inner ring of the support structure from being hit by radiation or debris from the radiation source. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A lithographic projection apparatus comprising:
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a radiation system configured to form a beam of radiation, the radiation system comprising; a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source, the contamination barrier comprising a support structure comprising an inner ring, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to shield the inner ring of the support structure from being hit by radiation or debris from the radiation source; a support structure to support a patterning structure to be irradiated by a beam of radiation to pattern the beam of radiation; a substrate support to support a substrate; and a projection system to image an irradiated portion of the patterning structure onto a target portion of the substrate. - View Dependent Claims (14, 15, 16)
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17. A method of manufacturing an integrated structure by a lithographic process, the method comprising:
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generating radiation with a radiation source; capturing debris from the radiation source using a contamination barrier comprising a support structure comprising an inner ring, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to shield the inner ring of the support structure from being hit by radiation or debris from the radiation source; patterning the radiation with a patterning structure; and imaging the patterned radiation onto a target portion of a substrate. - View Dependent Claims (18, 19, 20, 21)
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Specification