High efficiency LED with tunnel junction layer
First Claim
1. A light emitting diode (LED), comprising:
- a first n-type layer of Group III nitride semiconductor material;
an active region of Group III nitride semiconductor material electrically connected to said first n-type layer;
a p-type layer of Group III nitride semiconductor material electrically connected to said active region;
a second n-type layer of Group III nitride semiconductor material electrically connected with said p-type layer;
a p-type junction layer of Group III nitride semiconductor material interposed directly between said second n-type layer and said p-type layer such that there are no intervening layers and comprising a material different from said second n-type layer and said p-type layer;
anda tunnel junction between said p-type layer and second n-type layer, such that said active region emits light upon the application of a bias applied across said first and second n-type layers, wherein said junction layer comprises AlGaN and said second n-type and p-type layers comprise GaN.
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Accused Products
Abstract
An LED made from a wide band gap semiconductor material and having a low resistance p-type confinement layer with a tunnel junction in a wide band gap semiconductor device is disclosed. A dissimilar material is placed at the tunnel junction where the material generates a natural dipole. This natural dipole is used to form a junction having a tunnel width that is smaller than such a width would be without the dissimilar material. A low resistance p-type confinement layer having a tunnel junction in a wide band gap semiconductor device may be fabricated by generating a polarization charge in the junction of the confinement layer, and forming a tunnel width in the junction that is smaller than the width would be without the polarization charge. Tunneling through the tunnel junction in the confinement layer may be enhanced by the addition of impurities within the junction. These impurities may form band gap states in the junction.
13 Citations
15 Claims
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1. A light emitting diode (LED), comprising:
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a first n-type layer of Group III nitride semiconductor material; an active region of Group III nitride semiconductor material electrically connected to said first n-type layer; a p-type layer of Group III nitride semiconductor material electrically connected to said active region; a second n-type layer of Group III nitride semiconductor material electrically connected with said p-type layer; a p-type junction layer of Group III nitride semiconductor material interposed directly between said second n-type layer and said p-type layer such that there are no intervening layers and comprising a material different from said second n-type layer and said p-type layer; and a tunnel junction between said p-type layer and second n-type layer, such that said active region emits light upon the application of a bias applied across said first and second n-type layers, wherein said junction layer comprises AlGaN and said second n-type and p-type layers comprise GaN. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A light emitting diode (LED), comprising:
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a first n-type layer of Group III nitride semiconductor material; an active region of Group III nitride semiconductor material electrically connected to said first n-type layer; a p-type layer of Group III nitride semiconductor material electrically connected to said active region; a second n-type layer of Group III nitride semiconductor material electrically connected with said p-type layer; a p-type junction layer of Group III nitride semiconductor material interposed directly between and comprising a material different from said second n-type layer and said p-type layer; and a tunnel junction between said p-type layer and second n-type layer, such that said active region emits light upon the application of a bias applied across said first and second n-type layers, wherein said junction layer comprises AlGaN, wherein said tunnel junction further comprises a plurality of first impurities at the transition from said junction layer to said second n-type layer and a plurality of second impurities at the transition from said junction layer to said p-type layer, wherein at least one of said first impurities comprises material having a deep donor state and another comprises material having a shallow donor state, and at least one of said second impurities comprises material having a deep donor state and another comprises material having a shallow donor state.
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Specification