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Lithographic attribute enhancement

  • US 7,738,075 B2
  • Filed: 05/23/2005
  • Issued: 06/15/2010
  • Est. Priority Date: 05/23/2005
  • Status: Active Grant
First Claim
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1. A method comprising:

  • characterizing a temperature response for one or more zones of a thermal plate based on an application of different temperature zone offsets to each of the one or more zones of the thermal plate during exposure of a first pattern on a surface of a substrate;

    measuring a value of an attribute of a second pattern exposed on the surface of the substrate;

    calculating corrective data based on the measured value of the attribute of the second pattern exposed on the surface of the substrate, the corrective data at least partially correcting non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate; and

    controlling temperature of the one or more zones of the thermal plate, wherein the thermal plate is used to heat or cool the substrate during the lithographic exposure process based on the corrective data.

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