Lithographic attribute enhancement
First Claim
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1. A method comprising:
- characterizing a temperature response for one or more zones of a thermal plate based on an application of different temperature zone offsets to each of the one or more zones of the thermal plate during exposure of a first pattern on a surface of a substrate;
measuring a value of an attribute of a second pattern exposed on the surface of the substrate;
calculating corrective data based on the measured value of the attribute of the second pattern exposed on the surface of the substrate, the corrective data at least partially correcting non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate; and
controlling temperature of the one or more zones of the thermal plate, wherein the thermal plate is used to heat or cool the substrate during the lithographic exposure process based on the corrective data.
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Abstract
A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.
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Citations
29 Claims
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1. A method comprising:
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characterizing a temperature response for one or more zones of a thermal plate based on an application of different temperature zone offsets to each of the one or more zones of the thermal plate during exposure of a first pattern on a surface of a substrate; measuring a value of an attribute of a second pattern exposed on the surface of the substrate; calculating corrective data based on the measured value of the attribute of the second pattern exposed on the surface of the substrate, the corrective data at least partially correcting non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate; and controlling temperature of the one or more zones of the thermal plate, wherein the thermal plate is used to heat or cool the substrate during the lithographic exposure process based on the corrective data. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A computer readable program product, embodied in a tangible medium, encoded with instructions that, if executed by a computing device causes the computing device to perform a method comprising:
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characterizing a temperature response for one or more zones of a thermal plate based on an application of different temperature zone offsets to each of the one or more zones of the thermal plate during exposure of a first pattern on a surface of a substrate; calculating corrective data based on a value of an attribute of a second pattern exposed on the surface of the substrate the corrective data at least partially correcting non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate; and controlling temperature of the one or more zones of the thermal plate, wherein the thermal plate is used to heat or cool the substrate based on the corrective data. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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21. A thermal plate system, comprising:
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a thermal plate configured to heat or cool a substrate and comprising a plurality of zones; and a controller configured to; characterize a temperature response for a plurality of zones of a thermal plate based on an application of different temperature zone offsets to each of the plurality of zones of the thermal plate during exposure of a first pattern on a surface of a substrate; and calculate corrective data based on a measured value of an attribute of a second pattern exposed on the surface of the substrate and to control temperature generated by a zone of the plurality of zones based on the corrective data, the corrective data configured to at least partially correct non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate. - View Dependent Claims (22, 23, 24, 25)
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26. A lithographic apparatus, comprising:
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a projection system configured to project a patterned beam of radiation onto a substrate; a substrate holder configured to hold the substrate; a thermal plate configured to heat or cool a substrate and comprising a plurality of zones; and a controller configured to; characterize a temperature response for the plurality of zones of the thermal plate based on an application of different temperature zone offsets to each of the plurality of zones of the thermal plate during exposure of a first pattern on a surface of the substrate; and calculate corrective data based on a sensor measured value of an attribute of a second pattern exposed on the surface of the substrate, to control temperature generated by a zone of the plurality of zones based on the corrective data, the corrective data configured to at least partially correct non-uniformity of the value of the attribute of the second pattern exposed on the surface of the substrate. - View Dependent Claims (27, 28, 29)
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Specification