Patterning device utilizing sets of stepped mirrors and method of using same
First Claim
1. A lithography apparatus, comprising:
- an illumination system configured to condition a beam of radiation;
a patterning device configured to pattern the beam of radiation, the patterning device comprising a controller and an array of stepped mirrors configured to pattern the beam of radiation, the array comprising a plurality of sets of the stepped mirrors, the stepped mirrors being controlled by the controller with respect to each other, adjacent ones of the stepped mirrors in each of the sets having perpendicular axes of rotation and perpendicular steps; and
a projection system configured to project the patterned beam onto a target area of a substrate.
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Accused Products
Abstract
A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.
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Citations
30 Claims
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1. A lithography apparatus, comprising:
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an illumination system configured to condition a beam of radiation; a patterning device configured to pattern the beam of radiation, the patterning device comprising a controller and an array of stepped mirrors configured to pattern the beam of radiation, the array comprising a plurality of sets of the stepped mirrors, the stepped mirrors being controlled by the controller with respect to each other, adjacent ones of the stepped mirrors in each of the sets having perpendicular axes of rotation and perpendicular steps; and a projection system configured to project the patterned beam onto a target area of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 26, 28)
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9. A patterning device configured to pattern a beam of radiation, comprising:
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a controller; and an array of stepped mirrors, the array comprising a plurality of sets of the stepped mirrors, the stepped mirrors being controlled by the controller with respect to each other, adjacent ones of the stepped mirrors in each of the sets having perpendicular axes of rotation and perpendicular steps. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 27, 29)
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17. A method, comprising:
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(a) rotating a first stepped mirror, in a set of four stepped mirrors, the first stepped mirror having a first step position and first rotation direction to a first rotation angle; (b) rotating a second stepped mirror in the set having a second step position and a second rotation direction to the first rotation angle; (c) rotating a third stepped mirror in the set having a third step position and a third rotation direction to a second rotation angle that is equal, but opposite, to the first rotation angle; and (d) rotating a fourth stepped mirror in the set having a fourth step position and a fourth rotation direction to the second rotation angle. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 30)
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Specification