Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler

• US 7,738,081 B2
• Filed: 05/06/2005
• Issued: 06/15/2010
• Est. Priority Date: 05/06/2005
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Jacobs, Hernes
• Primary Examiner(s): Kim; Peter B
• Assistant Examiner(s): LIU, MICHAEL
• Application Number:
  US11/123,232
• Publication Number:
  US 20060252270A1
• Time in Patent Office: 1,866 Days
• Field of Search: 355/72, 355/75, 355/73, 355/53, 414/935, 414/941
• US Class Current: 355/73
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: Y10S 414/141 includes means for gripping wafer

Abstract

A lithographic apparatus can include an illumination system that conditions a radiation beam, a patterning device that modulates the radiation beam, a substrate table that supports a substrate, and a projection system that projects the modulated radiation beam onto a target portion of the substrate. The lithographic apparatus can also include a substrate handler that loads and/or unloads a substrate on/from the substrate table. The substrate handler supports the substrate in a support plane and can include a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device can include a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.

Claims

1. A lithographic apparatus, comprising:

a system configured to provide a patterned radiation beam;

a substrate table comprising a first support surface configured to support a substrate and a first plurality of grooves disposed on the first support surface;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

a single support stage substrate handler including a first end and a second end that positions the substrate with respect to the substrate table and loads at the first end and/or unloads at the second end the substrate on/from the substrate table, the substrate handler comprising a second support surface configured to support the substrate in a support plane, a conveyor device that moves the substrate in a direction substantially parallel to the support plane, the conveyor device comprising,

a gripping device that moves the substrate in the direction, wherein the gripping device comprises a plurality of movable vacuum fingers located in a respective second plurality of grooves disposed on the second support surface, the second plurality of grooves aligned with the respective first plurality of grooves such that the movable vacuum fingers extend into the respective first plurality of grooves when the substrate is loaded and/or unloaded on/from the substrate table.

2. The lithographic apparatus of claim 1, wherein the gripping device, during gripping of the substrate, contacts only one side of the substrate.

3. The lithographic apparatus of claim 1, wherein the substrate handler is configured to provide an air bed on which the substrate is supported.

4. The lithographic apparatus of claim 1, wherein the substrate comprises a flat panel display.

5. The lithographic apparatus of claim 1, wherein the substrate handler simultaneously loads and/or unloads two or more substrates on/from the substrate handler.

6. A device manufacturing method, comprising:

projecting a patterned beam of radiation onto a substrate;

supporting the substrate, during the projection step, on a first support surface with a first plurality of grooves disposed thereon;

loading, at a first end of a single support stage substrate handler, and/or unloading, at a second end of the substrate handler, the substrate on/from the first support surface;

supporting, with the substrate handler, the substrate on a second support surface with a second plurality of grooves disposed thereon, wherein the second plurality of grooves is aligned with the respective first plurality of grooves;

moving, with a conveyor device, the substrate in a direction substantially parallel to the support plane; and

pushing or pulling, with a gripping device, the substrate in the direction, wherein the gripping device comprises a plurality of movable vacuum fingers located in the respective second plurality of grooves, the movable vacuum fingers configured to extend into the respective first plurality of grooves when the substrate is loading and/or unloading on/from the first support surface.

7. The device manufacturing method of claim 6, further comprising providing an air bed, with a friction reducing device, on which the substrate is supported.

8. The device manufacturing method of claim 6, wherein the pushing or the pulling of the substrate comprises contacting one side of the substrate.

9. The device manufacturing method of claim 6, wherein the loading and/or unloading of the substrate on/from the substrate support comprises simultaneously loading and/or unloading two or more substrates on/from the substrate handler.