Method of treating a gas stream

• US 7,740,815 B2
• Filed: 03/13/2006
• Issued: 06/22/2010
• Est. Priority Date: 03/22/2005
• Status: Active Grant

• Current Assignee: Edwards Limited (Atlas Copco AB)
• Original Assignee: Edwards Limited (Atlas Copco AB)
• Inventors: Smith, James Robert, Knight, Gary Peter
• Primary Examiner(s): Vanoy; Timothy C
• Application Number:
  US11/887,044
• Publication Number:
  US 20090202411A1
• Time in Patent Office: 1,562 Days
• Field of Search: 423/210, 423/240.R, 423/245.1, 423/245.2, 422/168
• US Class Current: 423/210
• CPC Class Codes: B01D 2251/10 Oxidants
• CPC Class Codes: B01D 2258/0216 from CVD treatment or semi-conductor manufacturing
• CPC Class Codes: B01D 53/46 Removing components of defined structure
• CPC Class Codes: B01D 53/72 Organic compounds not provided for in groups B01D53/48 - B01D53/70, e.g. hydrocarbons
• CPC Class Codes: B01J 19/002 Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
• CPC Class Codes: B01J 19/20 in the form of helices, e.g. screw reactors
• CPC Class Codes: B01J 2219/00263 Preventing explosion of the chemical mixture
• CPC Class Codes: B01J 2219/00265 Preventing flame propagation
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Abstract

A method of treating a gas stream containing silane or other silicon-containing gas is described, in which the gas stream is conveyed to a liquid ring pump or screw-mechanism pump, to which are also supplied an oxidant for oxidising the silicon-containing gas within the pump, and a liquid for forming a liquid ring or intermittent flushing within the pump. A liquid stream containing said liquid and a by-product of the oxidation of the silicon-containing gas is exhaust from the pump.

Claims

1. A method of treating a gas stream containing a silicon-containing gas, the method comprising the steps of:

conveying the gas stream to a pump;

supplying to the pump an oxidant for oxidising the silicon-containing gas within the pump and a liquid; and

exhausting from the pump said liquid containing a by-product of the oxidation of the silicon-containing gas

wherein the liquid comprises water or an aqueous solution.

2. The method according to claim 1 wherein the silicon-containing gas is a precursor used in the manufacture of a semiconductor device.

3. The method according to claim 1 wherein the silicon-containing gas is selected from the group consisting of silane, disilane, dichlorosilane, trichlorosilane, tetraethylorthosilicate (TEOS), a siloxane, and an organosilane.

4. The method according to claim 1 wherein the silicon-containing gas is a metallic or a non-metallic hydride selected from the group consisting of silane, disilane, dichlorosilane, trichlorosilane, phosphine and diborane.

5. The method according to claim 1 wherein the step of supplying to the pump an oxidant for oxidising the silicon-containing gas within the pump and a liquid, comprises supplying the liquid to the pump separately from the oxidant.

6. The method according to claim 1 wherein the step of supplying to the pump an oxidant for oxidising the silicon-containing gas within the pump and a liquid, comprises supplying the liquid to the pump separately from the gas stream.

7. The method according to claim 1 wherein the step of supplying to the pump an oxidant for oxidising the silicon-containing gas within the pump and a liquid, comprises supplying the liquid intermittently to the pump.

8. The method according to claim 1 wherein the oxidant is selected from the group consisting of oxygen, ozone, a peroxide and a halogenated species.

9. A method of treating a gas stream containing a pyrophoric gas, the method comprising the steps of:

conveying the gas stream to a pump;

supplying to the pump an oxidant for oxidising the pyrophoric gas within the pump and a liquid; and

exhausting from the pump said liquid containing a by-product of the oxidation of the pyrophoric gas,

wherein the liquid comprises water or an aqueous solution.

10. The method according to claim 9 wherein the pyrophoric gas is a metallic or a non-metallic hydride selected from the group consisting of silane, disilane, dichlorosilane, trichlorosilane, phosphine and diborane.

11. The method according to claim 9 wherein the step of supplying to the pump an oxidant for oxidising the pyrophoric gas within the pump and a liquid, comprises supplying the liquid to the pump separately from the oxidant.

12. The method according to claim 9 wherein the step of supplying to the pump an oxidant for oxidising the pyrophoric gas within the pump and a liquid, comprises supplying the liquid to the pump separately from the gas stream.

13. The method according to claim 9 wherein the step of supplying to the pump an oxidant for oxidising the pyrophoric gas within the pump and a liquid, comprises supplying the liquid intermittently to the pump.

14. The method according to claim 9 wherein the oxidant is selected from the group consisting of oxygen, ozone, a peroxide and a halogenated species.

15. The method according to claim 14 further comprising the step of supplying oxygen to the pump within a stream of air or other oxygen-containing gas.

16. The method according to claim 9 wherein the step of conveying the gas stream to the pump comprising conveying the gas stream at a pressure in the range from 50 to 500 mbar.

17. The method according to claim 9 wherein the pump is a liquid ring pump, the liquid forming a liquid ring within the liquid ring pump.

18. The method according to claim 17 wherein the step of supplying to the pump an oxidant for oxidising the pyrophoric gas within the pump and a liquid comprises supplying the liquid to the pump at a level below that at which the liquid containing said by-product is exhaust from the pump.

19. The method according to claim 9 wherein the pump comprises intermeshing rotors.

20. The method according to claim 19 wherein the pump comprises a screw-type pumping mechanism.

21. Apparatus for treating a gas stream containing a silicon-containing gas, the apparatus comprising:

a pump for receiving the gas stream;

supply means connected to the pump for supplying an oxidant for oxidising the silicon-containing gas within the pump, and a liquid; and

conveying means connected to the pump for conveying from the pump liquid containing a by-product of oxidation of the silicon-containing gas within the pump

wherein the liquid comprises water or an aqueous solution.

22. The apparatus according to claim 21 wherein the pump comprises a first inlet for receiving the gas stream, and a second inlet for receiving the oxidant.

23. The apparatus according to claim 22 wherein the pump comprises a third inlet for receiving the liquid.

24. The apparatus according to claim 21 wherein the supply means comprises an oxidant supply means connected to the pump for supplying a gas stream comprising the oxidant.

25. The apparatus according to claim 24 wherein the gas stream comprises a stream having at least one of air, ozone, a peroxide or a halogenated species.

26. The apparatus according to claim 21 wherein the supply means comprises a water supply means connected to the pump for supplying a stream of water to the pump.

27. The apparatus according to claim 21 wherein the pump is a liquid ring pump.

28. The apparatus according to claim 21 wherein the pump comprises intermeshing rotors.

29. The apparatus according to claim 28 wherein the pump comprises a screw-type pumping mechanism.

30. A system for evacuating a process chamber, the system comprising:

a vacuum pump for drawing a gas stream from the chamber; and

apparatus according to claim 21 for receiving the gas stream from the vacuum pump.

31. The system according to claim 30 wherein the vacuum pump is configured to exhaust the gas stream at a pressure in the range from 50 to 500 mbar.

32. The system according to claim 30 comprising a purge gas supply means connected to the pump for supplying a purge gas to the vacuum pump.

33. The system according to claim 32 wherein the purge gas is nitrogen.