Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate

• US 7,741,620 B2
• Filed: 10/25/2005
• Issued: 06/22/2010
• Est. Priority Date: 11/03/2004
• Status: Active Grant

• Current Assignee: Vistec Electron Beam GmbH (Dr. Johannes Heidenhain GmbH)
• Original Assignee: Vistec Electron Beam GmbH (Dr. Johannes Heidenhain GmbH)
• Inventors: Heinitz, Joachim, Doering, Hans-Joachim
• Primary Examiner(s): Vanore; David A
• Assistant Examiner(s): Logie; Michael J
• Application Number:
  US11/666,957
• Publication Number:
  US 20080128638A1
• Time in Patent Office: 1,701 Days
• Field of Search: 250/492.2, 250/492.1, 250/492.22, 250/396.R
• US Class Current: 250/492.2
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: H01J 2237/0437 Semiconductor substrate
• CPC Class Codes: H01J 2237/31774 Multi-beam
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over its surface. The multibeam modulator comprises a plurality of aperture groups composed of aperture row groups. The totality of all aperture rows defines a matrix of m×n cells, where m cells form a row, and k openings are formed in each row. The density of openings within a row is inhomogeneously distributed.

Claims

1. A multibeam modulator which generates a plurality of individual beams from a particle beam, the particle beam illuminating said multibeam modulator at least partially over a surface thereof, said multibeam modulator comprising:

a plurality of openings having equal size, each opening being arranged in a cell of a matrix of m×

n cells;

wherein the matrix comprises;

a number m of matrix columns, each with a number n of cells; and

a number n of matrix rows, each with a number m of cells and a number k of openings;

wherein a size of each cell of the matrix is equal to the size of one of the openings, such that each opening occupies the entire cell in which each opening is arranged;

wherein all of the openings in each matrix row form an aperture row within a limited portion of each matrix row, such that a number of cells of each aperture row is less than the number m of cells of each matrix row;

wherein the density of the k openings within each matrix row is inhomogeneously distributed; and

wherein a distance between the k openings of a single matrix row is equal to an integer multiple of the size of one of the cells.

2. The multibeam modulator according to claim 1;

wherein the openings within each matrix row are evenly spaced, wherein the distance between the openings measured in cells is less than the quotient of the number m of cells of each matrix row and the number k of openings within each matrix row.

3. The multibeam modulator according to claim 2;

wherein the number k of openings within each matrix row is between 64 and 512.

4. The multibeam modulator according to claim 1;

wherein the number m of cells in each matrix row is 4096.

5. The multibeam modulator according to claim 1;

wherein 3 to 7 cells are provided between the openings within each matrix row.

6. The multibeam modulator according to claim 1;

wherein the cells have a square shape and correspond to a pixel to be written on a target.

7. The multibeam modulator according to claim 1;

wherein a plurality of aperture rows combine to form aperture row subgroups, and a plurality of aperture row subgroups form an aperture row group.

8. The multibeam modulator according to claim 7;

wherein six aperture rows combine to form aperture row subgroups.

9. The multibeam modulator according to claim 8;

wherein neighboring aperture row groups in row direction are offset in each instance by 684 cells in row direction and 1 to 5 cells orthogonal to the row direction.

10. The multibeam modulator according to claim 8;

wherein the aperture row groups are offset inhomogeneously.

11. The multibeam modulator according to claim 1;

wherein a plurality of aperture row groups combine to form aperture groups and are uniformly arranged on a chip of an aperture plate.

12. The multibeam modulator according to claim 11;

wherein the aperture groups are arranged symmetrically around a center.

13. The multibeam modulator according to claim 11;

wherein at least one electronic circuit is structured on the active aperture plate.

14. The multibeam modulator according to claim 13;

wherein at least one electronic circuit supplies data to the shift registers formed on the aperture plate.

15. The multibeam modulator according to claim 14;

wherein a shift register chain is associated with each aperture row, which shift register chain provides for a synchronous shifting of the input data from cell to cell from the first aperture opening to the final aperture opening of every aperture row.

16. The multibeam modulator according to claim 15;

wherein grayscale information of bit width 1 to b is provided to the modulator elements of the multibeam modulator by the shift registers, where b is between 6 bits and 8 bits.

17. The multibeam modulator according to claim 16;

wherein a combinational logic is provided in addition to the shift registers of the aperture rows per aperture to obtain the on/off signal from the grayscale information.

18. The multibeam modulator according to claim 16;

wherein a sequential logic circuit is provided in addition to the shift registers of the aperture rows per aperture to obtain the on/off signal from the grayscale information.

19. The multibeam modulator according to claim 18;

wherein the shift register of the grayscale information is used for programming the sequential logic circuit and a suitable “

Config”

signal network is implemented in addition.

20. The multibeam modulator according to claim 11;

wherein the aperture groups are separated by webs on which no structuring with apertures is carried out.

21. The multibeam modulator according to claim 20;

wherein the webs are parallel.

22. A method of using a multibeam modulator for maskless structuring of substrates, comprising the steps of:

generating a plurality of individual beams in that a particle beam illuminates the multibeam modulator at least partially over its surface; and

forming a plurality of equally sized openings in the multibeam modulator, such that each opening is arranged in a cell of a matrix of m×

n cells;

wherein the matrix comprises;

a number m of matrix columns, each with a number n of cells; and

a number n of matrix rows, each with a number m of cells and a number k of openings;

wherein a size of each cell of the matrix is equal to the size of one of the openings, such that each opening occupies the entire cell in which each opening is arranged;

wherein all of the openings in each matrix row form an aperture row within a limited portion of each matrix row, such that a number of cells of each aperture row is less than the number m of cells of each matrix row;

wherein the density of the k openings within each matrix row is inhomogeneously distributed; and

wherein a distance between the k openings of a single matrix row is equal to an integer multiple of the size of one of the cells.