Lithographic apparatus and device manufacturing method for writing a digital image

• US 7,742,148 B2
• Filed: 06/08/2005
• Issued: 06/22/2010
• Est. Priority Date: 06/08/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Groos, Pieter Johannes Marius
• Primary Examiner(s): Chea; Thorl
• Application Number:
  US11/147,466
• Publication Number:
  US 20060281032A1
• Time in Patent Office: 1,840 Days
• Field of Search: 430/302, 430/397, 355/53, 355/67
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

First pluralities of radiation spots generated by an array of individually controllable elements are exposed on a substrate. The radiation spots are equally spaced across an entire area of the substrate to be exposed. The substrate is then shifted relative to the array of individually controllable elements in a direction perpendicular to a scanning direction of the substrate. Second pluralities of radiation spots generated by the array of individually controllable elements are alternatingly formed on the substrate with respect to each of the first plurality of spots.

Claims

1. A lithographic projection apparatus, comprising:

a first patterning array of individually controllable elements configured to generate a first set of spot exposures during a first exposure of a substrate; and

a second patterning array of individually controllable elements located in a first direction relative to the first patterning array configured to generate a second set of spot exposures during a second exposure of the substrate,

wherein the second patterning array is arranged such that each spot exposure of the first set alternates with each spot exposure of the second set in a second direction perpendicular to the first direction, wherein the spot exposures of the first set are separated from the spot exposures of the second set by at least one spot width.

2. The lithographic projection apparatus of claim 1, wherein the patterning array is oriented at an angle that is greater than zero degrees with respect to the first direction.

3. The lithographic projection apparatus of claim 2, wherein the angle is such that there is an integer number of spot widths in the second direction between consecutive spot exposures in the first plurality of spot exposures.

4. A lithographic projection apparatus, comprising:

a first patterning array of individually controllable elements configured to generate a first set of spot exposures during a first exposure of a substrate; and

a second patterning array of individually controllable elements located in a first direction relative to the first patterning array configured to generate a second set of spot exposures during a second exposure of the substrate,

wherein the second patterning array is arranged such that spot exposures of the first set alternate with spot exposures of the second set in the first direction, wherein the spot exposures generated by the first patterning array are separated from the spot exposures generated by the second patterning array by at least one spot width.

5. The lithographic projection apparatus of claim 4, wherein the patterning array is oriented at an angle that is greater than zero degrees with respect to the first direction.

6. The lithographic projection apparatus of claim 5, wherein the angle is such that there is an integer number of spot widths in the second direction between consecutive spot exposures in the first plurality of spot exposures.