RF plasma supply device
First Claim
1. A method for controlling the power output of an RF plasma supply device, the method comprising:
- producing at least a first and a second RF power signal;
coupling at least two RF power signals into a coupled RF power in dependence on the RF power signals;
distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load; and
adjusting the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
1 Assignment
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Accused Products
Abstract
The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
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Citations
27 Claims
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1. A method for controlling the power output of an RF plasma supply device, the method comprising:
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producing at least a first and a second RF power signal; coupling at least two RF power signals into a coupled RF power in dependence on the RF power signals; distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load; and adjusting the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An RF plasma supply device for supplying a plasma load with plasma power, the device comprising:
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at least two RF generators for producing a first and a second RF power signal, at least one coupling member in which a coupled RF power is produced from the RF power signals, and having a first output connected to the plasma load and a second output connected to an equalizing load, and a control device coupled to the RF generators to control the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power is distributed to the equalizing load and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power is distributed to the equalizing load. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27)
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Specification