Coater having interrupted conveyor system

• US 7,749,364 B2
• Filed: 08/29/2005
• Issued: 07/06/2010
• Est. Priority Date: 09/03/2004
• Status: Active Grant

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated)
• Inventors: Hartig, Klaus
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US11/214,663
• Publication Number:
  US 20060048708A1
• Time in Patent Office: 1,772 Days
• Field of Search: 204/298.23, 204/298.24, 204/298.25, 204/298.26, 118/719, 118/718
• US Class Current: 204/298.23
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 2218/365 Coating different sides of a glass substrate
• CPC Class Codes: C23C 14/0652 Silicon nitride
• CPC Class Codes: C23C 14/086 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 14/10 Glass or silica
• CPC Class Codes: C23C 14/185 by cathodic sputtering
• CPC Class Codes: C23C 14/56 Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• CPC Class Codes: C23C 14/568 Transferring the substrates through a series of coating stations C23C14/562 takes precedence

Abstract

Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for conveying the substrate along a path of substrate travel extending through the coater. The substrate transport system in certain embodiments includes an upward coating deposition gap. The coater preferably has a source of coating material adapted for delivering coating material upwardly through such gap and onto a bottom major surface of the substrate as the substrate is conveyed along a desired portion of the path of substrate travel, which portion of the path of substrate travel extends over the upward coating deposition gap.

Claims

1. A coater for applying thin films onto a sheet-like substrate, the coater having a substrate transport system adapted for conveying the substrate along a path of substrate travel extending through the coater, the substrate transport system including two conveyor loops separated by an upward coating deposition gap, at least one of the conveyor loops traveling around a generally horizontal row of upper rotatable bodies which support the weight of the substrate during conveyance, and traveling around one or more underside rotatable bodies during conveyance, the one or more underside rotatable bodies being positioned below the row of upper rotatable bodies such that upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of less than 180 degrees, the coater having a source of coating material adapted for delivering coating material upwardly through said gap onto a bottom major surface of the substrate as the substrate is conveyed along a desired portion of the path of substrate travel, said desired portion of the path of substrate travel extending over the upward coating deposition gap.

2. The coater of claim 1, wherein each of said two conveyor loops comprises a conveyor sheet having a width of at least about 1 meter.

3. The coater of claim 1, wherein each of said two conveyor loops comprises a conveyor sheet having a width of at least about 2 meters.

4. The coater of claim 1, wherein each of said two conveyor loops comprises a conveyor sheet having generally-opposed lateral side edges between which the conveyor sheet forms a continuous wall devoid of gaps.

5. The coater of claim 1, wherein each of said two conveyor loops comprises a conveyor sheet having generally-opposed lateral side edges and having a major surface that is substantially entirely generally planar, such that when the bottom major surface of the substrate is positioned directly on said major surface there is a lateral extent of contact between said major surface and the substrate'"'"'s bottom surface, said lateral extent of contact extending substantially entirely between the lateral side edges of the conveyor sheet.

6. The coater of claim 1, wherein at least part of the source of coating material is positioned directly beneath the upward coating deposition gap.

7. The coater of claim 1, wherein the coater includes a deposition chamber defining an interior cavity, the path of substrate travel extends through the deposition chamber, and said source of coating material is disposed at least in part within the deposition chamber.

8. The coater of claim 7, wherein the deposition chamber is a vacuum deposition chamber adapted for carrying out at least one vacuum deposition process.

9. The coater of claim 8, wherein the vacuum deposition chamber is adapted for establishing and maintaining a gas pressure in said interior cavity of less than about 0.1 torr.

10. The coater of claim 1, wherein said source of coating material includes a thin film deposition apparatus selected from the group consisting of a sputter deposition apparatus, an ion-assisted deposition apparatus, a chemical vapor deposition apparatus, and a vacuum evaporation apparatus.

11. The coater of claim 10, wherein said source of coating material includes a sputter deposition apparatus comprising a sputtering target.

12. The coater of claim 11, wherein the sputtering target has a length, the upward coating deposition gap has a length, and the target is positioned directly beneath said gap so that the target'"'"'s length is generally parallel to the gap'"'"'s length.

13. The coater of claim 11, further comprising a power supply adapted for delivering an electric charge to the sputtering target.

14. The coater of claim 1, wherein the coater is a large-area coater and the substrate transport system is adapted for conveying substrates each having a width of at least about 1.5 meters.

15. The coater of claim 1, wherein the coater is a large-area coater and the substrate transport system is adapted for conveying substrates each having a width of at least about 2 meters.

16. The coater of claim 1, wherein the coater is a large-area coater and said source of coating material comprises a sputtering target having a length of at least about 1 meter.

17. The coater of claim 1, wherein the coater is a large-area coater and said source of coating material comprises a sputtering target having a length of at least about 1.5 meters.

18. The coater of claim 1, wherein the upward coating deposition gap has a length, said source of coating material is adapted to deliver a flux of coating material, said flux having a length that is at least about 50% as great as the length of the upward coating deposition gap.

19. The coater of claim 1, wherein the upward coating deposition gap has a length, said source of coating material is adapted to deliver a flux of coating material, said flux having a length that is at least about 75% as great as the length of the upward coating deposition gap.

20. The coater of claim 1, wherein the substrate has a width, and the upward coating deposition gap has a length that is at least as great as the substrate'"'"'s width.

21. The coater of claim 20, wherein said source of coating material is adapted for delivering a flux of coating material, said flux having a length that is at least as great as the substrate'"'"'s width, such that said source of coating material is adapted for full-area coating of the bottom major surface of the substrate.

22. The coater of claim 1, wherein the substrate has a width, and said source of coating material is a sputtering target having a length that is at least about 70% as great as the substrate'"'"'s width.

23. The coater of claim 1, wherein the substrate has a length, the upward coating deposition gap has a width, and the width of said gap is less than one half the length of the substrate.

24. The coater of claim 1, wherein at least one of the upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of about 90 degrees.

25. A coater for applying thin films onto two generally-opposed major surfaces of a sheet-like substrate, the coater having a substrate transport system adapted for conveying the substrate along a path of substrate travel extending through the coater, the substrate transport system including two conveyor loops separated by an upward coating deposition gap, at least one of the conveyor loops traveling around a generally horizontal row of upper rotatable bodies which support the weight of the substrate during conveyance, and traveling around one or more underside rotatable bodies during conveyance, the one or more underside rotatable bodies being positioned below the row of upper rotatable bodies such that upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of less than 180 degrees, the coater having an upper source of coating material positioned above the path of substrate travel and a lower source of coating material positioned below the path of substrate travel, said upper source being adapted for delivering coating material downwardly toward the path of substrate travel, said lower source being adapted for delivering coating material upwardly through said gap toward the path of substrate travel.

26. The coater of claim 25, wherein the coater includes a vacuum deposition chamber defining an interior cavity, the path of substrate travel extends through the vacuum deposition chamber, and the vacuum deposition chamber is adapted for establishing and maintaining a gas pressure in said interior cavity of less than about 0.1 ton.

27. The coater of claim 25, wherein said upper source of coating material comprises a sputtering target, and said lower source of coating material includes a thin film deposition apparatus selected from the group consisting of a sputter deposition apparatus, an ion-assisted deposition apparatus, a chemical vapor deposition apparatus, and a vacuum evaporation apparatus.

28. The coater of claim 25, wherein the coater includes a series of thin film deposition apparatuses positioned on a common side of the path of substrate travel such that the deposition apparatuses of said series are either above or below the path of substrate travel, the deposition apparatuses of said series being adapted to deposit a low-emissivity coating on the substrate.

29. The coater of claim 28, said series of deposition apparatuses including at least one apparatus adapted for depositing a silver-containing film on the substrate.

30. The coater of claim 28, wherein the deposition apparatuses of said series are positioned above the path of substrate travel.

31. The coater of claim 28, wherein said series of deposition apparatuses includes sputtering targets.

32. The coater of claim 25, wherein at least one of the upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of about 90 degrees.

33. A coater for applying thin films onto a sheet-like substrate, the coater comprising:

a substrate transport system adapted for conveying the substrate through the coater, the substrate transport system having a conveyor loop defining a pocket; and

a source of coating material disposed at least partially within the pocket defined by the conveyor loop of the substrate transport system.

34. The coater of claim 33, wherein the substrate transport system defines a path of substrate travel extending through the coater, and said source of coating material is below the path of substrate travel.

35. The coater of claim 33, wherein said pocket is open upwardly toward the path of substrate travel, and said source of coating material is adapted for delivering coating material upwardly onto a bottom major surface of the substrate when the substrate is in a desired position on the transport system.

36. The coater of claim 33, wherein the substrate has a width, and the pocket has a length that is at least as great as the substrate'"'"'s width.

37. The coater of claim 36, wherein said source of coating material is adapted for delivering a flux of coating material, said flux having a length that is at least as great as the substrate'"'"'s width, such that said source of coating material is adapted for full-area coating of a bottom major surface of the substrate.

38. The coater of claim 36, wherein said source of coating material is a sputtering target having a length that is at least about 70% as great as the substrate'"'"'s width.

39. The coater of claim 33, wherein the substrate has a length, the pocket has a width, and the width of the pocket is less than one half the length of the substrate.

40. The coater of claim 33, wherein the coater includes a deposition chamber defining an interior cavity, the substrate transport system defines a path of substrate travel extending through the deposition chamber, and said source of coating material is disposed at least in part within the deposition chamber.

41. The coater of claim 40, wherein the deposition chamber is a vacuum deposition chamber adapted for carrying out at least one vacuum deposition process.

42. The coater of claim 41, wherein the vacuum deposition chamber is adapted for establishing and maintaining a gas pressure in said interior cavity of less than about 0.1 torr.

43. The coater of claim 33, wherein said source of coating material includes a thin film deposition apparatus selected from the group consisting of a sputter deposition apparatus, an ion-assisted deposition apparatus, a chemical vapor deposition apparatus, and a vacuum evaporation apparatus.

44. The coater of claim 43, wherein said source of coating material includes a sputter deposition apparatus comprising a sputtering target.

45. The coater of claim 44, wherein the sputtering target is disposed at least partially within the pocket defined by the conveyor loop of the substrate transport system.

46. The coater of claim 45, further comprising a gas-delivery outlet disposed within the pocket defined by the conveyor loop of the substrate transport system.

47. The coater of claim 46, further comprising a gas supply coupled with, and/or adapted for being coupled with, a gas-delivery line leading to the gas-delivery outlet.

48. The coater of claim 45, further comprising an anode disposed at least partially within the pocket defined by the conveyor loop of the substrate transport system.

49. The coater of claim 48, further comprising a power supply for providing a voltage differential between the sputtering target and the anode.

50. The coater of claim 33, wherein the pocket is bounded by a generally-horizontal portion of the conveyor loop and by two generally-vertical confronting portions of the conveyor loop.

51. A coater for applying thin films onto two generally-opposed major surfaces of a sheet-like glass substrate having a major dimension of at least 1 meter, the coater having a substrate transport system adapted for conveying the glass substrate along a path of substrate travel extending through the coater, the substrate transport system having a conveyor with an upward coating deposition gap, at least one of the conveyor loops traveling around a generally horizontal row of upper rotatable bodies which support the weight of the substrate during conveyance, and traveling around one or more underside rotatable bodies during conveyance, the one or more underside rotatable bodies being positioned below the row of upper rotatable bodies such that upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of less than 180 degrees, the coater including an upper source of coating material positioned above the path of substrate travel and a lower source of coating material positioned below the path of substrate travel, said upper source being adapted for delivering coating material downwardly toward the path of substrate travel, said lower source being adapted for delivering coating material upwardly through said gap toward the path of substrate travel, wherein the upper source of coating material comprises a sputtering target, and the lower source of coating material includes a thin film deposition apparatus selected from the group consisting of a sputter deposition apparatus, an ion-assisted deposition apparatus, a chemical vapor deposition apparatus, and a vacuum evaporation apparatus.

52. The coater of claim 51, wherein said conveyor includes two conveyor loops separated by said upward coating deposition gap, wherein each conveyor loop comprises a conveyor sheet.

53. The coater of claim 51, wherein at least one of the upper rotatable bodies at each of two ends of the row of upper rotatable bodies have a conveyor wrap of about 90 degrees.