CMOS-compatible bulk-micromachining process for single-crystal MEMS/NEMS devices

• US 7,749,789 B2
• Filed: 03/18/2008
• Issued: 07/06/2010
• Est. Priority Date: 03/18/2008
• Status: Expired due to Fees

• Current Assignee: Solid-State Research, Inc.
• Original Assignee: Solid-State Research, Inc.
• Inventors: Papageorgiou, Demetrios P
• Primary Examiner(s): LEBENTRITT, MICHAEL
• Application Number:
  US12/050,206
• Publication Number:
  US 20090275162A1
• Time in Patent Office: 840 Days
• Field of Search: 438/29, 438 48- 53, 438453-459, 438/694, 438/723, 257/E21.001, 257/141, 257/152, 257/585, 257/586, 257/29.324
• US Class Current: 438/48
• CPC Class Codes: B81C 1/00246 Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
• CPC Class Codes: B81C 2203/0728 Pre-CMOS, i.e. forming the micromechanical structure before the CMOS circuit
• CPC Class Codes: H01L 27/0617 comprising components of the field-effect type H01L27/0251 takes precedence
• CPC Class Codes: H03H 3/0072 of microelectro-mechanical resonators or networks micromembranes or microbeams B81B2203/01; manufacture of microstructural devices in general B81C
• CPC Class Codes: H03H 9/2457 Clamped-free beam resonators

Abstract

A process producing a single-crystalline device fabricated on a single-sided polished wafer employing processing from only the front-side and having a significant separation between the device and substrate is provided. In one embodiment, a method comprises an upper layer and a lower substrate. A device is formed in the upper layer, defined by gaps. The gaps are filled with at least one material that has etch characteristics different from those of the device and the substrate. At least a top portion of the gap material is removed from the upper layer. The gap material is etched so that a portion of the gap-material remains on the sidewalls of the surrounding upper layer. The material beneath the device is then etched, excluding an insulating layer beneath the device, releasing the device from the substrate. The insulating material beneath the device is then etched, the etch being selective to the insulating material and the gap material.

Claims

1. A method for producing a micro/nanoelectromechanical system (MNEMS) device comprising:

providing a multilayer wafer comprising an upper layer, a middle layer, and a substrate;

forming a device in said upper layer material, wherein gaps are defined in said upper layer material;

filling said gaps with at least one protective gap material wherein said at least one protective gap material has etch characteristics different from etch characteristics of said device upper layer material and said substrate;

removing at least a top portion of said at least one protective gap material from said upper layer;

etching said at least one protective gap material, wherein a portion of said at least one protective gap material remains on sidewalls of surrounding said upper layer;

etching said substrate beneath said device excluding said middle layer, thereby releasing said device from said substrate; and

etching said middle layer wherein etch of said step of etching said middle layer is selective to said middle layer and said at least one protective gap material.

2. The method of claim 1, wherein said forming a device in said upper layer comprises a deep reactive ion etch (DRIE).

3. The method of claim 1, wherein said step of removing at least a top portion of said at least one protective gap material comprises chemical-mechanical polishing (CMP).

4. The method of claim 1, further comprising a step of at least partially forming circuitry performed after said step of removing at least a top portion of said at least one protective gap material.

5. The method of claim 1, wherein said step of etching said at least one protective gap material comprises deep reactive ion etching (DRIE).

6. The method of claim 1, wherein said step of etching said at least one protective gap material comprises a xenon difluoride (XeF₂) etch.

7. The method of claim 1, wherein said at least one protective gap material is one protective gap material and said step of etching said at least one protective gap material comprises a directional, anisotropic etch.

8. The method of claim 1, wherein etch of said step of etching said substrate beneath said device is selected from the group consisting of:

an isotropic etch, a first anisotropic etch followed by an isotropic etch, and a cycling of anisotropic/isotropic etches.

9. The method of claim 1, wherein said steps are performed in any order providing that high temperature processes of forming said device are performed before forming circuitry.

10. A method for producing a micro/nanoelectromechanical system (MNEMS) device comprising:

providing a multilayer wafer comprising an upper layer, a middle layer, and a substrate;

forming a device in said upper layer by defining gaps wherein a protecting layer is deposited on said upper layer, wherein said protecting layer has etch characteristics different from etch characteristics of said upper layer and said substrate;

etching said substrate beneath said device excluding said middle layer, thereby releasing said device from said substrate; and

etching said middle layer wherein etch of said step of etching said middle layer is selective to said middle layer and said protecting layer.

11. The method of claim 10, wherein said wafer comprises circuitry.

12. The method of claim 10, further comprising a step of etching through said middle layer performed after said step of forming a device.

13. The method of claim 10, wherein said step of forming a device comprises deep reactive ion etching (DRIE).

14. The method of claim 10, wherein said step of forming a device comprises etchants selected from the group consisting of:

sulfur hexafluoride (SF₆), oxygen (O₂), and silicon tetrafluoride (SiF₄).

15. The method of claim 10, wherein said step of etching said substrate comprises removing substrate beneath device while reforming a protecting layer.

16. The method of claim 10, wherein said steps are performed in any order providing that high temperature processes of forming said device are performed before forming circuitry.

17. An implant method for producing a micro/nanoelectromechanical system (MNEMS) device comprising:

providing a substrate;

implanting a middle layer;

etching to said implanted middle layer, thereby delineating a device;

etching through said implanted middle layer, thereby removing substrate beneath said device; and

removing said implanted middle layer beneath said device.

18. The method of claim 17, wherein said substrate comprises circuitry.

19. The method of claim 17, wherein said etching to said implanted middle layer step comprises a deep reactive ion etch (DRIE).

20. The method of claim 17, wherein steps may be performed in any order providing that high temperature processes of forming said device are performed before forming circuitry.