System and method for controlling field emissions

• US 7,750,779 B2
• Filed: 05/08/2009
• Issued: 07/06/2010
• Est. Priority Date: 04/04/2008
• Status: Expired due to Fees

• Current Assignee: Correlated Magnetics Research, LLC
• Original Assignee: Cedar Ridge Research LLC
• Inventors: Fullerton, Larry W., Roberts, Mark D.
• Primary Examiner(s): Barrera, Ramon M
• Application Number:
  US12/463,076
• Publication Number:
  US 20090251260A1
• Time in Patent Office: 424 Days
• Field of Search: 335/216, 335/285, 335296-306, 310/90.5, 104281-286
• US Class Current: 335/306
• CPC Class Codes: H01F 41/02 for manufacturing cores, coils, or magnets H01F41/14 takes precedence; for dynamo-electric machines H02K15/00
• CPC Class Codes: H01F 7/0278 for generating uniform fields, focusing, deflecting electrically charged particles for magnetic separation by Lorentz force B03C1/023; specially adapted for NMR applications G01R33/383
• CPC Class Codes: H01F 7/0284 using a trimmable or adjustable magnetic circuit, e.g. for a symmetric dipole or quadrupole magnetic field
• CPC Class Codes: H01L 27/0266 using field effect transistors as protective elements
• CPC Class Codes: H01P 11/00 Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
• CPC Class Codes: Y10T 24/32 having magnetic fastener
• CPC Class Codes: Y10T 29/49016 Antenna or wave energy "plumbing" making
• CPC Class Codes: Y10T 29/4902 Electromagnet, transformer or inductor
• CPC Class Codes: Y10T 29/49073 by assembling coil and core
• CPC Class Codes: Y10T 29/49075 including permanent magnet or core
• CPC Class Codes: Y10T 29/49826 Assembling or joining
• CPC Class Codes: Y10T 29/49904 Assembling a subassembly, then assembling with a second subassembly
• CPC Class Codes: Y10T 29/53091 for work-holder for assembly or disassembly
• CPC Class Codes: Y10T 29/5313 Means to assemble electrical device
• CPC Class Codes: Y10T 29/53265 with work-holder for assembly

Abstract

An improved field emission system and method is provided that involves field emission structures having electric or magnetic field sources. The magnitudes, polarities, and positions of the magnetic or electric field sources are configured to have desirable correlation properties, which may be in accordance with a code. The correlation properties correspond to a desired spatial force function where spatial forces between field emission structures correspond to relative alignment, separation distance, and the spatial force function.

Claims

1. A method for controlling field emissions, said method comprising the steps of:

associating a first field emission structure with a first object, said first field emission structure comprising;

a first plurality of first field emission sources; and

one or more second field emission sources;

associating a second field emission structure with a second object, said second field emission structure comprising;

a second plurality of first field emission sources, said first plurality of first field sources and said second plurality of first field sources producing an attractive force having a first engagement distance; and

one or more third field emission sources, said one or more second field emission sources and said one or more third field emission sources producing a repelling force having a second engagement distance; and

aligning said first field emission structure with said second field emission structure to achieve an equilibrium between said attractive force and said repelling force, wherein said equilibrium occurs at a separation distance between said first field emission structure and said second field emission structure that is less than said first engagement distance.

2. The method of claim 1, wherein said peak attractive force is in accordance with a defined spatial force function.

3. The method of claim 1, wherein said separation distance is greater than said second engagement distance.

4. The method of claim 1, wherein said repelling force is greater than said attractive force at said second engagement distance.

5. The method of claim 4, wherein said attractive force is greater than said repelling force at said first engagement distance.

6. The method of claim 1, wherein said first plurality of first field emission sources have positions and polarities in accordance with a code.

7. The method of claim 1, wherein the positions and polarities of said second plurality of first field emission sources mirror the positions and pluralities of said first plurality of first field emission sources.

8. The method of claim 1, wherein the positions and polarities of said second plurality of first field emission sources and the positions and pluralities of said first plurality of first field emission sources are in accordance with a desired spatial force function.

9. The method of claim 1, wherein said first plurality of first field sources and said second plurality of first field sources are substantially aligned when each one of said first plurality of first field emission sources are aligned with a corresponding one of said second plurality of first field emission sources.

10. A system for controlling field emissions, comprising:

a first field emission structure associated with a first object, said first field emission structure comprising;

a first plurality of first field emission sources; and

one or more second field emission sources; and

a second field emission structure associated with a second object, said second field emission structure comprising;

a second plurality of first field emission sources, said first plurality of first field sources and said second plurality of first field sources producing an attractive force having a first engagement distance; and

one or more third field emission sources, said one or more second field emission sources and said one or more third field emission sources producing a repelling force having a second engagement distance, where an equilibrium is achieved between said attractive force and said repelling force, wherein said equilibrium occurs at a separation distance between said first field emission structure and said second field emission structure that is less than said first engagement distance.

11. The system of claim 10, wherein said attractive force is in accordance with a defined spatial force function.

12. The system of claim 10, wherein said separation distance is greater than said second engagement distance.

13. The system of claim 10, wherein said repelling force is greater than said attractive force at said second engagement distance.

14. The system of claim 13, wherein said attractive force is greater than said repelling force at said first engagement distance.

15. The system of claim 10, wherein said first plurality of first field emission sources have positions and polarities in accordance with a code.

16. The system of claim 10, wherein the positions and polarities of said second plurality of first field emission sources mirror the positions and pluralities of said first plurality of first field emission sources.

17. The system of claim 10, wherein the positions and polarities of said second plurality of first field emission sources and the positions and pluralities of said first plurality of first field emission sources are in accordance with a desired spatial force function.

18. The system of claim 10, wherein said first plurality of first field sources and said second plurality of first field sources are substantially aligned when each one of said first plurality of first field emission sources are aligned with a corresponding one of said second plurality of first field emission sources.