Method of fabricating a liquid crystal display device, comprising forming a protective film so that one end of the protective film is contacted with one end of the transparent conductive pattern.
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- a first mask process of forming a first mask pattern group including a gate line, a gate electrode, a common line and a common electrode on a substrate;
a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern and an opaque conductive pattern on the gate insulating film; and
a third mask process of forming a transparent conductive pattern on the opaque conductive pattern so that a data line crossing the gate line, a source electrode and a drain electrode are formed of a double-layer structure having the opaque conductive pattern and the transparent conductive pattern, and a pixel electrode is extended from the transparent conductive pattern of the drain electrode to form a horizontal electric field with the common electrode, and forming a protective film so that one end of the protective film is contacted with one end of the transparent conductive pattern.
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Abstract
A method of fabricating a liquid crystal display device according to the present invention includes a first mask process of forming a first mask pattern group including a gate line, a gate electrode, a common line and a common electrode on a substrate, a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern and an opaque conductive pattern on the gate insulating film, and a third mask process of forming a transparent conductive pattern on the opaque conductive pattern and forming a protective film, wherein one end of the protective film is contacted with one end of the transparent conductive pattern.
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Citations
12 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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a first mask process of forming a first mask pattern group including a gate line, a gate electrode, a common line and a common electrode on a substrate; a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern and an opaque conductive pattern on the gate insulating film; and a third mask process of forming a transparent conductive pattern on the opaque conductive pattern so that a data line crossing the gate line, a source electrode and a drain electrode are formed of a double-layer structure having the opaque conductive pattern and the transparent conductive pattern, and a pixel electrode is extended from the transparent conductive pattern of the drain electrode to form a horizontal electric field with the common electrode, and forming a protective film so that one end of the protective film is contacted with one end of the transparent conductive pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification