Liquid crystal display and fabricating method thereof
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- forming a first conductive pattern group including a gate line and a gate electrode, a common line, a plurality of common electrodes, a plurality of pixel electrodes and a pad on a substrate;
forming an insulating film including a plurality of contact holes and a semiconductor pattern on the first conductive pattern group; and
forming a second conductive pattern group including a data line, a source electrode and a drain electrode on the insulating film and exposing an active layer of the semiconductor pattern,wherein at least a first of the common electrodes has a multiple-layer structure having a transparent conductive layer and a substantially opaque conductive layer, and at least a second of the common electrodes is formed of the transparent conductive layer.
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Abstract
A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad is formed on a substrate. An insulating film including a plurality of contact holes and a semiconductor pattern is formed on the first mask pattern group. And a second conductive pattern group including a data line, a source electrode and a drain electrode is formed on an insulating film provided with the semiconductor pattern, and exposes an active layer of the semiconductor pattern.
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Citations
25 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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forming a first conductive pattern group including a gate line and a gate electrode, a common line, a plurality of common electrodes, a plurality of pixel electrodes and a pad on a substrate; forming an insulating film including a plurality of contact holes and a semiconductor pattern on the first conductive pattern group; and forming a second conductive pattern group including a data line, a source electrode and a drain electrode on the insulating film and exposing an active layer of the semiconductor pattern, wherein at least a first of the common electrodes has a multiple-layer structure having a transparent conductive layer and a substantially opaque conductive layer, and at least a second of the common electrodes is formed of the transparent conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification