Interferometric lithographic projection apparatus

• US 7,751,030 B2
• Filed: 01/30/2006
• Issued: 07/06/2010
• Est. Priority Date: 02/01/2005
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: McCafferty, Diane C., Markoya, Louis, Sewell, Harry, Kreuzer, Justin L., Khmelichek, Aleksandr
• Primary Examiner(s): Nguyen; Hung Henry
• Assistant Examiner(s): WHITESELL GORDON, STEVEN H
• Application Number:
  US11/341,381
• Publication Number:
  US 20060170896A1
• Time in Patent Office: 1,618 Days
• Field of Search: 355/53, 355/55, 355/67, 355/22, 355/71, 430/5, 359/31, 359/577
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.

Claims

1. A lithographic projection apparatus, comprising:

an illumination system configured to condition a beam of radiation;

an interchangeable upper optics module configured to receive the beam and comprising a beam splitter configured to split the beam into multiple beam portions that are not afterward substantially diffracted; and

a lower optics module configured to receive the beam portions and direct the beam portions onto a same location on a substrate so as to create an interference pattern on a radiation-sensitive surface of the substrate, the interference pattern comprising a periodic series of intensity minima and maxima arising from interference between the beam portions,

wherein the interchangeable upper optics module comprises a reflecting surface configured to direct the beam portions toward the same location and the interchangeable upper optics module is interchangeable for a different interchangeable upper optics module so as to change the interference pattern.

2. The lithographic projection apparatus of claim 1, wherein the beamsplitter is configured to split the beam into multiple beam portions by diffracting zeroth, first and second order diffraction beams.

3. The lithographic projection apparatus of claim 1, wherein the beamsplitter is configured to split the beam into multiple beam portions by diffracting zeroth, first and second order diffraction beams and the interchangeable upper optics module is provided with an aperture plate to block the zeroth order diffraction beam.

4. The lithographic projection apparatus of claim 1, wherein the interchangeable upper optics module is provided with an aperture plate to block unwanted beam portions.

5. The lithographic projection apparatus of claim 1, further comprising:

an automated fluid dispensing system to dispense an immersion liquid between the lower optics module and the substrate.

6. The lithographic projection apparatus of claim 1, wherein the beamsplitter comprises a phase shifting beamsplitter.

7. The lithographic projection apparatus of claim 1, wherein the beamsplitter comprises a linear grating.

8. The lithographic projection apparatus of claim 1, wherein the beamsplitter comprises a checkerboard grating.

9. The lithographic projection apparatus of claim 8, wherein the checkerboard grating comprises a phase shifted checkerboard grating.

10. The lithographic projection apparatus of claim 1, wherein the beamsplitter comprises a basket weave grating.

11. The lithographic projection apparatus of claim 1, wherein the beamsplitter comprises an etched face basket weave grating.

12. The lithographic projection apparatus of claim 11, wherein the etched face basket weave grating comprises a phase shifted checkerboard grating.

13. The lithographic projection apparatus of claim 1, wherein the lower optics module comprises a prism.

14. The lithographic projection apparatus of claim 1, wherein the lower optics module is configured to direct four beam portions to form the interference pattern.

15. The lithographic projection apparatus of claim 14, wherein pairs of beam portions of the four beam portions have a different pitch.

16. The lithographic projection apparatus of claim 1, wherein the lower optics module is configured to direct two of the beam portions to form the interference pattern.

17. A lithographic projection apparatus, comprising:

an illumination system configured to condition a beam of radiation;

an interchangeable upper optics module configured to receive the beam and comprising a beam splitter configured to split the beam into multiple beam portions that are not afterward substantially diffracted; and

a lower optics module configured to receive four beam portions and direct the beam portions onto a same location on a substrate so as to create a two dimensional interference pattern on a radiation-sensitive surface of the substrate, the interference pattern comprising a periodic series of intensity minima and maxima arising from interference between the beam portions;

wherein the interchangeable upper optics module comprises a reflecting surface configured to direct the beam portions toward the same location and the interchangeable upper optics module is interchangeable for a different interchangeable upper optics module so as to change the interference pattern.

18. A method of using the projection apparatus of claim 17 to direct the beam portion with the lower optics module to form a contact hole pattern.

19. The method according to claim 18 wherein the contact hole pattern comprises rectangular contact holes.

20. The method according to claim 18 wherein the contact hole pattern comprising oval contact holes.

21. The lithographic projection apparatus of claim 17 wherein the reflecting surface is provided on a prism.

22. A lithographic projection apparatus, comprising:

an illumination system configured to condition a beam of radiation;

a plurality of interchangeable upper optics modules configured to be swapped into a path of the beam under computer control, each interchangeable upper optics module comprising a beam splitter configured to split the beam into multiple beam portions that are not afterward substantially diffracted; and

a lower optics module configured to receive the beam portions and direct the beam portions onto a same location on a substrate so as to create an interference pattern on a radiation-sensitive surface of the substrate, the interference pattern comprising a periodic series of intensity minima and maxima arising from interference between the beam portions,

wherein at least one interchangeable upper optics module comprises a reflecting surface configured to direct the beam portions toward the same location and the at least one interchangeable upper optics module is interchangeable for a different interchangeable upper optics module so as to change the interference pattern.

23. The projection apparatus of claim 22, further comprising:

an automated fluid dispensing and recovery system to dispense and recover fluid from between the lower optics module and the substrate.

24. The projection apparatus of claim 22, wherein each of the plurality of interchangeable upper optics modules is configured to produce a different resolution of a contact hole pattern.

25. The projection apparatus of claim 22, wherein each of the plurality of interchangeable upper optics modules is configured to produce a different contact hole shape of a contact hole pattern.